Electron Beam-Induced Reduction of Cuprite

被引:3
作者
Siudzinska, Anna [1 ,2 ,3 ]
Gorantla, Sandeep M. [1 ]
Serafinczuk, Jaroslaw [1 ,4 ]
Kudrawiec, Robert [1 ,5 ]
Hommel, Detlef [1 ,2 ]
Bachmatiuk, Alicja [1 ,3 ,6 ]
机构
[1] PORT Polish Ctr Technol Dev, Lukasiewicz Res Network, Stablowicka 147, PL-54066 Wroclaw, Poland
[2] PAS, Inst Low Temp & Struct Res, 2 Okolna St, PL-50422 Wroclaw, Poland
[3] Inst Complex Mat, IFW Dresden, 20 Helmholtz Str, D-01069 Dresden, Germany
[4] Wroclaw Univ Sci & Technol, Fac Elect Photon & Microsyst, Dept Nanometrol, Wybrzeze Wyspianskiego 27, PL-50370 Wroclaw, Poland
[5] Wroclaw Univ Sci & Technol, Fac Fundamental Problems Technol, Dept Semicond Mat Engn, Wybrzeze Wyspianskiego 27, PL-50370 Wroclaw, Poland
[6] Soochow Univ, Soochow Inst Energy & Mat Innovat, Key Lab Adv Carbon Mat & Wearable Energy Technol, Suzhou 215006, Peoples R China
关键词
electron beam irradiation; cupprite; catalysis; HRTEM; IN-SITU; OXIDATION;
D O I
10.3390/met12122151
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cu-based materials are used in various industries, such as electronics, power generation, and catalysis. In particular, monolayered cuprous oxide (Cu2O) has potential applications in solar cells owing to its favorable electronic and magnetic properties. Atomically thin Cu2O samples derived from bulk cuprite were characterized by high-resolution transmission electron microscopy (HRTEM). Two voltages, 80 kV and 300 kV, were explored for in situ observations of the samples. The optimum electron beam parameters (300 kV, low-current beam) were used to prevent beam damage. The growth of novel crystal structures, identified as Cu, was observed in the samples exposed to isopropanol (IPA) and high temperatures. It is proposed that the exposure of the copper (I) oxide samples to IPA and temperature causes material nucleation, whereas the consequent exposure via e-beams generated from the electron beam promotes the growth of the nanosized Cu crystals.
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页数:8
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