Investigation of ablation thresholds of optical materials using 1-μm-focusing beam at hard X-ray free electron laser

被引：35

作者：

Koyama, Takahisa ^{[1
]}

Yumoto, Hirokatsu ^{[1
]}

Senba, Yasunori ^{[1
]}

Tono, Kensuke ^{[1
]}

Sato, Takahiro ^{[2
]}

Togashi, Tadashi ^{[1
]}

Inubushi, Yuichi ^{[2
]}

Katayama, Tetsuo ^{[1
]}

Kim, Jangwoo ^{[3
]}

Matsuyama, Satoshi ^{[3
]}

Mimura, Hidekazu ^{[4
]}

Yabashi, Makina ^{[2
]}

Yamauchi, Kazuto ^{[3
]}

Ohashi, Haruhiko ^{[1
]}

Ishikawa, Tetsuya ^{[2
]}

机构：

[1] Japan Synchrotron Radiat Res Inst JASRI, Sayo, Hyogo 6795198, Japan

[2] RIKEN SPring 8 Ctr, Sayo, Hyogo 6795148, Japan

[3] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan

[4] Univ Tokyo, Grad Sch Engn, Dept Precis Engn, Bunkyo Ku, Tokyo 1138656, Japan

来源：

OPTICS EXPRESS | 2013年 / 21卷 / 13期

关键词：

PULSES;

D O I：

10.1364/OE.21.015382

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We evaluated the ablation thresholds of optical materials by using hard X-ray free electron laser. A 1-mu m-focused beam with 10-keV of photon energy from SPring-8 Angstrom Compact free electron LAser (SACLA) was irradiated onto silicon and SiO2 substrates, as well as the platinum and rhodium thin films on these substrates, which are widely used for optical materials such as X-ray mirrors. We designed and installed a dedicated experimental chamber for the irradiation experiments. For the silicon substrate irradiated at a high fluence, we observed strong mechanical cracking at the surface and a deep ablation hole with a straight side wall. We confirmed that the ablation thresholds of uncoated silicon and SiO2 substrates agree with the melting doses of these materials, while those of the substrates under the metal coating layer are significantly reduced. The ablation thresholds obtained here are useful criteria in designing optics for hard X-ray free electron lasers. (C) 2013 Optical Society of America

引用

页码：15382 / 15388

页数：7

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