Biomimetic Antireflective Si Nanopillar Arrays

被引:107
作者
Xu, Hongbo [1 ]
Lu, Nan [1 ]
Qi, Dianpeng [1 ]
Hao, Juanyuan [1 ]
Gao, Liguo [1 ]
Zhang, Bo [1 ]
Chi, Lifeng [1 ,2 ,3 ]
机构
[1] Jilin Univ, State Key Lab Supermol Struct & Mat, Coll Chem, Changchun 130012, Peoples R China
[2] Univ Munster, Inst Phys, D-48149 Munster, Germany
[3] Univ Munster, Ctr Nantechnol CeNTech, D-48149 Munster, Germany
基金
中国国家自然科学基金;
关键词
antireflectivity; biomimetics; nanopillars; reactive ion etching; spherical monolayers;
D O I
10.1002/smll.200800282
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Biomimetic Silicon (Si) nanopillar arrays with antireflection behavior were created based on the combination of self-assembly of polymer spheres into two-dimensional (2D) arrays and reaction-ion etching (RIE). The results indicate that for the Si nanopillars created with 460 nm sphere masks, the aspect ratios of the 3 nanopillar arrays range from 0.79 to 0.9,w here the highest one is created by 290s etching. The Fresnel reflection can be reduced by inserting a layer with an intermediate index between two media. The Si nanopillar arrays have flat tops and grooves and that the residual reflection of 8% is induced by the index changing abruptly at the air/top and groove/air interfaces. The reflectivity is reduced by optimization of the etching conditions and choosing proper spheres to obtain the perfect tapered shapes.
引用
收藏
页码:1972 / 1975
页数:4
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