Towards clean and atomically flat ZnO (0001) surfaces

被引：1

作者：

Seldrum, T ^{[1
]}

Couet, S

Brison, J

Moisson, C

Turover, D

Sporken, R

Dumont, J

机构：

[1] Fac Univ Notre Dame Paix, Lab Phys Mat Elect, 61 Rue Bruxelles, B-5000 Namur, Belgium

[2] Fac Univ Notre Dame Paix, Lab Interdisciplinaire Spect Elect, B-5000 Namur, Belgium

[3] Novasic, NOVASiC Savoie Technol, F-7375 Le Bourget Du Lac, France

来源：

PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 4 | 2006年 / 3卷 / 04期

关键词：

D O I：

10.1002/pssc.200564761

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We established a cleaning procedure to obtain atomically flat (000 (1) over bar) surfaces from pressurized melt grown ZnO using ex-situ and in-situ processing. The ex-situ chemical cleaning consisted in removing the surface fluid layer and contaminants from the surface. The physical in-situ procedure used sputtering-annealing cycles to clean and reconstruct the surface. 3 key parameters were in-situ investigated: the annealing time, the annealing temperature and the sputtering energy. Investigations were carried out by means of Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), X-ray Photo-emission Spectroscopy (XPS), Time of Flight of Secondary Ion Mass Spectrometry (ToF-SIMS), Atomic Force Microscopy and Spectroscopy (AFM and AFS) and Scanning Tunnelling Microscopy (STM).

引用

页码：1051 / +

页数：2

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