Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

被引：12

作者：

Lu, YX ^{[1
]}

Hu, W ^{[1
]}

Ma, Y ^{[1
]}

Zhang, LB ^{[1
]}

Sun, JQ ^{[1
]}

Lu, N ^{[1
]}

Shen, JC ^{[1
]}

机构：

[1] Jilin Univ, Coll Chem, Key Lab Supramol Struct & Mat, Changchun 130012, Peoples R China

来源：

MACROMOLECULAR RAPID COMMUNICATIONS | 2006年 / 27卷 / 07期

关键词：

layer-by-layer assembly; lithography; multilayer films; nanoimprint lithography; polyelectrolytes; pattern;

D O I：

10.1002/marc.200500834

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Polyelectrolyte multilayer films of poly(acrylic acid) (PAA)/poly(allylamine hydrochloride) (PAH) and PAH/ poly(sodium 4-styrenesulfonate) (PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 min, well-defined pattern structures with a line width of approximate to 330 nm and a separation of approximate to 413 nm are achieved. Meanwhile, hydrogen-bonding-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PMAA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.

引用

页码：505 / 510

页数：6

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