Patterning layered polymeric multilayer films by room-temperature nanoimprint lithography

被引：12
|
作者：
Lu, YX [1 ]
Hu, W [1 ]
Ma, Y [1 ]
Zhang, LB [1 ]
Sun, JQ [1 ]
Lu, N [1 ]
Shen, JC [1 ]
机构：
[1] Jilin Univ, Coll Chem, Key Lab Supramol Struct & Mat, Changchun 130012, Peoples R China
来源：
MACROMOLECULAR RAPID COMMUNICATIONS | 2006年 / 27卷 / 07期
关键词：
layer-by-layer assembly; lithography; multilayer films; nanoimprint lithography; polyelectrolytes; pattern;
D O I：
10.1002/marc.200500834
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Polyelectrolyte multilayer films of poly(acrylic acid) (PAA)/poly(allylamine hydrochloride) (PAH) and PAH/ poly(sodium 4-styrenesulfonate) (PSS) based on electrostatic interactions as a driving force are patterned by room-temperature nanoimprint lithography (RT-NIL). Under an imprinting pressure of 40 bar for 8 min, well-defined pattern structures with a line width of approximate to 330 nm and a separation of approximate to 413 nm are achieved. Meanwhile, hydrogen-bonding-directed multilayer films of poly(vinyl pyrrolidone) (PVPON)/ poly(methyl acrylic acid) (PMAA) and poly(4-vinylpyridine)/ PAA can also be patterned in a similar way by RT-NIL. The successful imprinting of these films originates from the high compressibility and fluidity of the layered polymeric films under high pressure.
引用
收藏
页码：505 / 510
页数：6
相关论文
共 50 条
  • [1] Polymeric distributed feedback lasers by room-temperature nanoimprint lithography
    Mele, Elisa
    Camposeo, Andrea
    Stabile, Ripalta
    Del Carro, Pompilio
    Di Benedetto, Francesca
    Persano, Luana
    Cingolani, Roberto
    Pisignano, Dario
    APPLIED PHYSICS LETTERS, 2006, 89 (13)
  • [2] Room-temperature nanoimprint lithography of non-thermoplastic organic films
    Pisignano, D
    Persano, L
    Raganato, MF
    Visconti, P
    Cingolani, R
    Barbarella, G
    Favaretto, L
    Gigli, G
    ADVANCED MATERIALS, 2004, 16 (06) : 525 - +
  • [3] Room-temperature nanoimprint lithography for crystalline poly(fluoroalkyl acrylate) thin films
    Honda, Koji
    Morita, Masamichi
    Masunaga, Hiroyasu
    Sasaki, Sono
    Takata, Masaki
    Takahara, Atsushi
    SOFT MATTER, 2010, 6 (05) : 870 - 875
  • [4] Room-temperature and low-pressure nanoimprint lithography
    Lebib, A
    Chen, Y
    Cambril, E
    Youinou, P
    Studer, V
    Natali, M
    Pépin, A
    Janssen, HM
    Sijbesma, RP
    MICROELECTRONIC ENGINEERING, 2002, 61-2 : 371 - 377
  • [5] Bilayer resist method for room-temperature nanoimprint lithography
    Nakamatsu, K.-I., 1600, Japan Society of Applied Physics (43):
  • [6] Bilayer resist method for room-temperature nanoimprint lithography
    Nakamatsu, K
    Watanabe, K
    Tone, K
    Katase, T
    Hattori, W
    Ochiai, Y
    Matsuo, T
    Sasago, M
    Namatsu, H
    Komuro, M
    Matsui, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (6B): : 4050 - 4053
  • [7] Room-temperature nanoimprint lithography using photosensitive dry film
    Nakamatsu, K
    Tone, K
    Matsui, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (5A): : 4290 - 4292
  • [8] Pattern generation by using multistep room-temperature nanoimprint lithography
    Harrer, Stefan
    Yang, Joel K. W.
    Salvatore, Giovanni A.
    Berggren, Karl K.
    Ilievski, Filip
    Ross, Caroline A.
    IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2007, 6 (06) : 639 - 644
  • [9] Room-temperature nanoimprint lithography using photosensitive dry film
    Nakamatsu, Ken-ichiro
    Matsui, Shinji
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2006, 19 (03) : 389 - 392
  • [10] Room-temperature Si single-electron memory fabricated by nanoimprint lithography
    Wu, W
    Gu, J
    Ge, HX
    Keimel, C
    Chou, SY
    APPLIED PHYSICS LETTERS, 2003, 83 (11) : 2268 - 2270
12345