Evidence for electrically induced drift of threshold voltage in Ge2Sb2Te5

被引:8
作者
Cassinerio, M. [1 ]
Ciocchini, N.
Ielmini, D.
机构
[1] Politecn Milan, Dipartimento Elttron Informaz & Bioingn, I-20133 Milan, MI, Italy
关键词
PHASE-CHANGE MEMORY; AMORPHOUS-SILICON; STRUCTURAL RELAXATION; NONVOLATILE MEMORIES; RESISTANCE; DENSITY; CARBON; FILMS;
D O I
10.1063/1.4811553
中图分类号
O59 [应用物理学];
学科分类号
摘要
Threshold voltage (V-T) is an important parameter in phase change memory (PCM), marking the minimum voltage needed to program the memory device. In this work, we demonstrate that subthreshold pulses at V < V-T can induce an increase of V-T. The pulse-induced modification of V-T is explained primarily due to the Joule heating during V-T measurement accelerating the structural relaxation in the amorphous phase-change material. Our results demonstrate that V-T can be adjusted through applied voltage pulses in the subthreshold regime, allowing the stabilization of programmed PCM states. (C) 2013 AIP Publishing LLC.
引用
收藏
页数:4
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