Study of microstructure deflections and film/substrate curvature under generalized stress fields and mechanical properties

被引：7
作者：
Camarda, Massimo [1 ]
Anzalone, Ruggero [1 ]
La Magna, Antonino [1 ]
La Via, Francesco [1 ]
机构：
[1] CNR, IMM, Sez Catania, I-95121 Catania, Italy
来源：
THIN SOLID FILMS | 2012年 / 522卷
关键词：
Stress; Hetero epitaxy; Micro-structures; THIN-FILMS; SINGLE; STRAIN; SIMULATION; ACCURATE; EQUATION;
D O I：
10.1016/j.tsf.2012.02.014
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this article we use a recently developed analytical stress theory to describe hetero-epitaxial growths, extending the analysis capability in case of extreme conditions of strongly nonlinear dependence of the local strain field and of the elastic properties (Young modulus) on the film thickness. We apply this extended theory to study the heteroepitaxial growth of cubic silicon carbide on silicon (100). (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码：26 / 29
页数：4
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