N-2 tunnel wafer transport system

被引:0
|
作者
Toda, M
Ohmi, T
Nitta, T
Saito, Y
Kanno, Y
Umeda, M
Yagai, M
Kidokoro, H
机构
来源
JOURNAL OF THE INSTITUTE OF ENVIRONMENTAL SCIENCES | 1997年 / 40卷 / 01期
关键词
ultraclean; nitrogen gas film; nitrogen tunnel; wafer transportation; silicon wafer handling; large-sized wafer; clean wafer surface;
D O I
暂无
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
A wafer transport system has been developed for application to the next generation of ULSI manufacturing processes. In this system, various kinds of wafers ranging from 8 to 12 in. are floated on a gas film to be transported through an ultraclean N-2 gas environment with no solid contact. A sensor controls the movement of the transported wafer on the control unit precisely and rapidly (i.e., a sensor instantly detects and recognizes the configuration of the wafer and lets the wafer stop, facing in the right direction. In this ultraclean N-2 gas environment, the wafer surface is free from particle contamination and growth of native oxide. Furthermore, moving the electrostatic clamping device on the track, and the jet flow of ultraclean N-2 gas against the track, allows self-cleaning of the wafer transport track.
引用
收藏
页码:23 / 28
页数:6
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