A Study of Parameters Affecting Atom Probe Tomography Specimen Survivability

被引:13
作者
Prosa, Ty J. [1 ]
Strennen, Savanna [2 ]
Olson, David [3 ]
Lawrence, Dan [4 ]
Larson, David J. [1 ]
机构
[1] CAMECA Instruments Inc, 5470 Nobel Dr, Madison, WI 53711 USA
[2] PPD Labs, GMP Lab, 8551 Res Way,Suite 90, Middleton, WI 53562 USA
[3] ThermoFisher Sci, 5350 NE Dawson Creek Dr, Hillsboro, OR 97124 USA
[4] TESCAN Instruments Inc, 765 Commonwealth Dr, Warrendale, PA 15086 USA
关键词
analysis yield; experimental design; electric field; tensile stress; silicon-based materials; FIELD-ION SPECIMENS; ELECTRIC-FIELD; TEMPERATURE; EVAPORATION; STRESS; EXPLANATION; PERFORMANCE; FRACTURE;
D O I
10.1017/S1431927618015258
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Specimen survivability is a primary concern to those who utilize atom probe tomography (APT) for materials analysis. The state-of-the-art in understanding survivability might best be described as common-sense application of basic physics principles to describe failure mechanisms. For example, APT samples are placed under near-failure mechanical-stress conditions, so reduction in the force required to initiate field evaporation must provide for higher survivability-a common sense explanation of survivability. However, the interplay of various analytical conditions (or instrumentation) and how they influence survivability (e.g., decreasing the applied evaporation field improves survivability), and which factors have more impact than others has not been studied. In this paper, we report on the systematic analysis of a material composed of a silicon-dioxide layer surrounded on two sides by silicon. In total, 261 specimens were fabricated and analyzed under a variety of conditions to correlate statistically significant survivability trends with analysis conditions and other specimen characteristics. The primary result suggests that, while applied field/force plays an obvious role in survivability for this material, the applied field alone does not predict survivability trends for silicon/silicon-dioxide interfaces. The rate at which ions are extracted from the specimen (both in terms of ions-per-pulse and pulse-frequency) has similar importance.
引用
收藏
页码:425 / 437
页数:13
相关论文
共 61 条
[1]   Vacuum electric discharge initiated by accelerated nanoparticles [J].
Adamenko, SV ;
Bereznyak, PA ;
Mikhailovskii, IM ;
Stratienko, VA ;
Tolmachev, NG ;
Adamenko, AS ;
Mazilova, TI .
TECHNICAL PHYSICS LETTERS, 2001, 27 (08) :671-673
[2]  
[Anonymous], 2014, Atom-Probe Tomography
[3]   Energy deficit of pulsed-laser field-ionized and field-emitted ions from non-metallic nano-tips [J].
Arnoldi, L. ;
Silaeva, E. P. ;
Gaillard, A. ;
Vurpillot, F. ;
Blum, I. ;
Rigutti, L. ;
Deconihout, B. ;
Vella, A. .
JOURNAL OF APPLIED PHYSICS, 2014, 115 (20)
[4]   MASS SPECTROMETRIC ANALYSIS OF LOW TEMPERATURE FIELD EVAPORATION [J].
BAROFSKY, DF ;
MULLER, EW .
SURFACE SCIENCE, 1968, 10 (02) :177-&
[5]   ELECTRIC FIELD AND STRESS ON A FIELD-ION SPECIMEN [J].
BIRDSEYE, PJ ;
SMITH, DA .
SURFACE SCIENCE, 1970, 23 (01) :198-&
[6]  
Bunton J., 2010, Microsc Microanal, V16, P10, DOI DOI 10.1017/S1431927610060241
[7]   Advances in pulsed-laser atom probe: Instrument and specimen design for optimum performance [J].
Bunton, Joseph H. ;
Olson, Jesse D. ;
Lenz, Daniel R. ;
Kelly, Thomas F. .
MICROSCOPY AND MICROANALYSIS, 2007, 13 (06) :418-427
[8]  
CAMECA, 2012, LEAP 5000 SYST US
[9]   Aspects of the performance of a femtosecond laser-pulsed 3-dimensional atom probe [J].
Cerezo, A. ;
Clifton, P. H. ;
Gomberg, A. ;
Smith, G. D. W. .
ULTRAMICROSCOPY, 2007, 107 (09) :720-725
[10]   Measurement of temperature rises in the femtosecond laser pulsed three-dimensional atom probe [J].
Cerezo, A ;
Smith, GDW ;
Clifton, PH .
APPLIED PHYSICS LETTERS, 2006, 88 (15)