Absolute surface energies of oxygen-adsorbed GaN surfaces

被引:13
作者
Kawamura, Takahiro [1 ,2 ]
Akiyama, Toru [1 ]
Kitamoto, Akira [2 ]
Imanishi, Masayuki [2 ]
Yoshimura, Masashi [2 ]
Mori, Yusuke [2 ]
Morikawa, Yoshitada [2 ]
Kangawa, Yoshihiro [3 ]
Kakimoto, Koichi [3 ]
机构
[1] Mie Univ, Grad Sch Engn, 1577 Kurimamachiya Cho, Tsu, Mie 5148507, Japan
[2] Osaka Univ, Grad Sch Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan
[3] Kyushu Univ, Res Inst Appl Mech, Kasuga, Fukuoka 8168580, Japan
关键词
First-principles calculation; Surface structure; Oxide vapor phase epitaxy; Nitrides; Semiconducting III-V materials; IMPURITY INCORPORATION; GA2O VAPOR; GROWTH; FILMS; DEPENDENCE; ADSORPTION; GAAS;
D O I
10.1016/j.jcrysgro.2020.125868
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Absolute surface energies of reconstructed polar, nonpolar, and semi-polar GaN surfaces formed under oxide vapor phase epitaxy (OVPE) growth conditions were investigated via first-principles calculations. The relationships of stable surface orientations and surface structures with the growth conditions of Ga pressure and temperature were examined in terms of absolute surface energies. The stability of the surface orientation was in the order (000 (1) over bar), (1 (1) over bar 01), (1 (1) over bar0 0), (11 (2) over bar0), (0001), and (1 (1) over bar0 (1) over bar). High O concentrations on OVPE-grown GaN could be explained in relation to the stability of the (1 (1) over bar 01) surface. The stable (1 (1) over bar 01) surface consisted of N vacancies and H and O adatoms. Therefore, it was deduced that its appearance results in increased O impurity incorporation.
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页数:7
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