Fabrication of ZrO2 nanopatterns for biomimetic antireflection by thermal nanoimprint lithography

被引：16

作者：

Kim, Jae Kwan ^{[1
]}

Park, Seong-Je ^{[1
]}

Kim, Sarah ^{[1
]}

Park, Hyeong-Ho ^{[1
]}

Kim, Ki-don ^{[1
]}

Choi, Jun-Hyuk ^{[1
]}

Lee, Jihye ^{[1
]}

Choi, Dae-Geun ^{[1
]}

Suh, Kahp Y. ^{[2
]}

Jeong, Jun-Ho ^{[1
]}

机构：

[1] Korea Inst Machinery & Mat, Nanomech Syst Res Ctr, Taejon 305343, South Korea

[2] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea

来源：

MICROELECTRONIC ENGINEERING | 2012年 / 100卷

关键词：

Antireflection; ZrO2; Hardness; Nanoimprint; SUBWAVELENGTH STRUCTURES; NANOSTRUCTURES; MIMICKING; SURFACES; FILMS;

D O I：

10.1016/j.mee.2012.07.111

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a simple thermal nanoimprint method to fabricate biomimetic moth-eye nanostructures for enhancing transmittance using an ultraviolet (UV) curable perfluoropolyether (PFPE) for the polymer mold and zirconium dioxide (ZrO2) as the imprint material. To transfer the moth-eye nanostructures, a replicated PFPE mold from the Nickel (Ni) master was imprinted onto spin-coated ZrO2 film with a pressure of 6 bar and temperature of 150 degrees C. The results revealed that imprinted ZrO2 moth-eye nanostructures have excellent property such as transmittance (97.6%) when the both-sided pattern was fabricated on the glass substrate. (c) 2012 Elsevier B.V. All rights reserved.

引用

页码：12 / 15

页数：4

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