Suppression of magnetic trench material in bit patterned media fabricated by blanket deposition onto prepatterned substrates

被引：17

作者：

Hellwig, O. ^{[1
]}

Moser, A. ^{[1
]}

Dobisz, E. ^{[1
]}

Bandic, Z. Z. ^{[1
]}

Yang, H. ^{[1
]}

Kercher, D. S. ^{[1
]}

Risner-Jamtgaard, J. D. ^{[1
]}

Yaney, D. ^{[1
]}

Fullerton, E. E. ^{[1
,2
]}

机构：

[1] Hitachi Global Storage Technol, San Jose Res Ctr, San Jose, CA 95135 USA

[2] Univ Calif San Diego, Ctr Magnet Recording Res, La Jolla, CA 92093 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 19期

关键词：

annealing; chemical interdiffusion; cobalt; magnetic moments; magnetic multilayers; magnetic recording; palladium; perpendicular magnetic anisotropy; silicon compounds;

D O I：

10.1063/1.3013857

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An attractive approach for bit patterned media fabrication is the blanket deposition of magnetic material onto prepatterned substrates with elevated pillars and recessed trench areas. One issue with this method is the residual magnetic material in the trenches that causes disturbing stray fields during writing and readback. Here we present a technique to suppress the magnetic moment in the trenches with an additional annealing step by using prepatterned substrates consisting of SiN pillars on a Si wafer. The annealing triggers an interdiffusion process between the magnetic media and the Si in the trenches that results in the formation of a nonmagnetic silicide, while the magnetic moment on top of the SiN pillars remains substantially unaltered.

引用

页数：3

共 13 条

[1] LIGHT-DIFFRACTION EFFECTS IN THE MAGNETOOPTICAL PROPERTIES OF 2D ARRAYS OF MAGNETIC DOTS OF AU/CO/AU(111) FILMS WITH PERPENDICULAR MAGNETIC-ANISOTROPY [J].

BARDOU, N ;

BARTENLIAN, B ;

ROUSSEAUX, F ;

DECANINI, D ;

CARCENAC, F ;

CHAPPERT, C ;

VEILLET, P ;

BEAUVILLAIN, P ;

MEGY, R ;

SUZUKI, Y ;

FERRE, J .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1995, 148 (1-2) :293-294

[2]

BRADY MJ, 1996, Patent No. 5585140

[3] STEP-EDGE JUNCTION FABRICATION BY A SI-YBCO REACTIVE PATTERNING TECHNIQUE [J].

CAMERLINGO, C ;

HUANG, H ;

RUGGIERO, B ;

RUSSO, M ;

SARNELLI, E ;

TESTA, G ;

CORRERA, L ;

GUERRI, S ;

NERI, S ;

NICOLETTI, S ;

PIZZOCHERO, G ;

SU, Y .

PHYSICA C, 1994, 232 (1-2) :44-48

[4]

FULLERTON EE, 2008, Patent No. 20080112079

[5] Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media [J].

Hellwig, O. ;

Berger, A. ;

Thomson, T. ;

Dobisz, E. ;

Bandic, Z. Z. ;

Yang, H. ;

Kercher, D. S. ;

Fullerton, E. E. .

APPLIED PHYSICS LETTERS, 2007, 90 (16)

[6] Magnetization reversal in Co/Pd nanostructures and films [J].

Hu, G ;

Thomson, T ;

Rettner, T ;

Raoux, S ;

Terris, BD .

JOURNAL OF APPLIED PHYSICS, 2005, 97 (10)

[7] SI-YBACUO INTERMIXING AND REACTIVE PATTERNING TECHNIQUE [J].

MA, QY ;

YANG, ES ;

LAIBOWITZ, RB ;

CHANG, CA .

JOURNAL OF ELECTRONIC MATERIALS, 1992, 21 (05) :487-494

[8] Magnetization dynamics and thermal stability in patterned media -: art. no. 063512 [J].

Moritz, J ;

Dieny, B ;

Nozières, JP ;

van de Veerdonk, RJM ;

Crawford, TM ;

Weller, D ;

Landis, S .

APPLIED PHYSICS LETTERS, 2005, 86 (06) :1-3

[9] Magnetic recording: advancing into the future [J].

Moser, A ;

Takano, K ;

Margulies, DT ;

Albrecht, M ;

Sonobe, Y ;

Ikeda, Y ;

Sun, SH ;

Fullerton, EE .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (19) :R157-R167

[10] Off-track margin in bit patterned media [J].

Moser, Andreas ;

Hellwig, Olav ;

Kercher, Dan ;

Dobisz, Elisabeth .

APPLIED PHYSICS LETTERS, 2007, 91 (16)

← 1 2 →