Characterization and modeling of resistive switching phenomena in IGZO devices

被引:4
|
作者
Carvalho, G. [1 ,2 ]
Pereira, M. E. [3 ,4 ]
Silva, C. [3 ,4 ]
Deuermeier, J. [3 ,4 ]
Kiazadeh, A. [3 ,4 ]
Tavares, V. [1 ,2 ]
机构
[1] INESC TEC, Porto, Portugal
[2] Fac Engn Univ Porto FEUP, Porto, Portugal
[3] Univ NOVA Lisboa, Fac Ciencias & Tecnol, Dept Ciencias Mat, FCT,CENIMAT i3N, P-2825097 Almada, Caparica, Portugal
[4] Univ Nova Lisboa, CEMOP, P-2825097 Almada, Portugal
关键词
THERMIONIC-FIELD-EMISSION;
D O I
10.1063/5.0098145
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This study explores the resistive switching phenomena present in 4 mu m(2) amorphous Indium-Gallium-Zinc Oxide (IGZO) memristors. Despite being extensively reported in the literature, not many studies detail the mechanisms that dominate conduction on the different states of IGZO-based devices. In this article, we demonstrate that resistive switching occurs due to the modulation of the Schottky barrier present at the bottom interface of the device. Furthermore, thermionic field emission and field emission regimes are identified as the dominant conduction mechanisms at the high resistive state of the device, while the bulk-limited ohmic conduction is found at the low resistive state. Due to the high complexity associated with creating compact models of resistive switching, a data-driven model is drafted taking systematic steps. (C) 2022 Author(s).
引用
收藏
页数:9
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