共 33 条
Adhesive Ion-Gel as Gate Insulator of Electrolyte-Gated Transistors
被引:1
作者:

Jeong, Jaehoon
论文数: 0 引用数: 0
h-index: 0
机构:
KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
Tech Univ Darmstadt, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany
KIT, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany

Singaraju, Surya Abhishek
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h-index: 0
机构:
KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany

Aghassi-Hagmann, Jasmin
论文数: 0 引用数: 0
h-index: 0
机构:
KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
Offenburg Univ Appl Sci, Dept Elect Engn & Informat Technol, D-77652 Offenburg, Germany KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany

Hahn, Horst
论文数: 0 引用数: 0
h-index: 0
机构:
KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
Tech Univ Darmstadt, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany
KIT, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany
Helmholtz Inst Ulm Electrochem Energy Storage, Helmholtzstr 11, D-89081 Ulm, Germany KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany

Breitung, Ben
论文数: 0 引用数: 0
h-index: 0
机构:
KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
Karlsruhe Inst Technol, Karlsruhe Nano Micro Facil, D-76344 Eggenstein Leopoldshafen, Germany KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
机构:
[1] KIT, Inst Nanotechnol INT, D-76344 Eggenstein Leopoldshafen, Germany
[2] Tech Univ Darmstadt, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany
[3] KIT, Joint Res Lab Nanomat, Otto Berndt Str 3, D-64206 Darmstadt, Germany
[4] Offenburg Univ Appl Sci, Dept Elect Engn & Informat Technol, D-77652 Offenburg, Germany
[5] Helmholtz Inst Ulm Electrochem Energy Storage, Helmholtzstr 11, D-89081 Ulm, Germany
[6] Karlsruhe Inst Technol, Karlsruhe Nano Micro Facil, D-76344 Eggenstein Leopoldshafen, Germany
基金:
欧盟地平线“2020”;
关键词:
adhesive ion gels;
electrolyte-gated transistors;
ionic liquids;
ion gels;
printed electronics;
FIELD-EFFECT TRANSISTORS;
THIN-FILM TRANSISTORS;
CO-MALEIC ANHYDRIDE);
TRIBLOCK COPOLYMER;
HIGH CAPACITANCE;
HIGH-MOBILITY;
PERFORMANCE;
OXIDE;
CONDUCTIVITY;
DIELECTRICS;
D O I:
10.1002/celc.202000305
中图分类号:
O646 [电化学、电解、磁化学];
学科分类号:
081704 ;
摘要:
In this study, a facile method to fabricate a cohesive ion-gel based gate insulator for electrolyte-gated transistors is introduced. The adhesive and flexible ion-gel can be laminated easily on the semiconducting channel and electrode manually by hand. The ion-gel is synthesized by a straightforward technique without complex procedures and shows a remarkable ionic conductivity of 4.8 mS cm(-1) at room temperature. When used as a gate insulator in electrolyte-gated transistors (EGTs), an on/off current ratio of 2.24x10(4) and a subthreshold swing of 117 mV dec(-1) can be achieved. This performance is roughly equivalent to that of ink drop-casted ion-gels in electrolyte-gated transistors, indicating that the film-attachment method might represent a valuable alternative to ink drop-casting for the fabrication of gate insulators.
引用
收藏
页码:2735 / 2739
页数:5
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