Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge

被引:4
|
作者
Ehiasarian, A. P. [1 ]
Hovsepian, P. Eh. [1 ]
机构
[1] Sheffield Hallam Univ, Natl HIPIMS Technol Ctr, Howard St, Sheffield S1 1WB, England
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2024年 / 42卷 / 02期
基金
英国工程与自然科学研究理事会;
关键词
AUSTENITIC STAINLESS-STEEL; LOW-TEMPERATURE; MICROSTRUCTURE; LOAD;
D O I
10.1116/6.0003277
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Lifetime and biocompatibility of orthopedic implants are crucial in meeting the new challenges brought about by the fall in the patient age and the aging population. The high-load surfaces in contact with the biological environment must display enhanced tribological properties, biocompatibility, and reduced metal ion release in long-term clinical performance. Surface modification techniques such as nitriding can significantly improve the in-service behavior of the medical-grade alloys in current use. We report on a novel approach for nitriding of CoCrMo alloys using high power impulse magnetron sputtering (HIPIMS) discharge. The new nitriding process has been successfully carried out at the National HIPIMS Technology Centre at Sheffield Hallam University, UK, in an industrial size Hauzer 1000-4 system enabled with HIPIMS technology. While the nitriding ion flux is controlled by the HIPIMS magnetron plasma source, the ion energy can be independently set via the substrate bias. Implementing the HIPIMS source allows reducing the operational pressure by one order of magnitude compared to conventional dc plasma nitriding (DCPN). Plasma analyses have identified significantly enhanced production of ions of molecular nitrogen (N-2(+)), atomic nitrogen (N+), and N2H+ radicals in the HIPIMS discharge compared to DCPN. Because of the low pressure of operation of the HIPIMS process, the energy of ions is similar to the bias voltage, whereas the high pressures used in DCPN cause severe losses in ion energy due to scattering collisions within the sheath. The high flux and high ion energy are primarily responsible for achieving a fourfold increase in process productivity as compared to state-of-the-art plasma nitriding processes. The nitrided surface layers exhibit excellent mechanical and tribological properties, which bring about significant improvements in hardness, fracture toughness, and wear. The protective function of the nitrided layer against corrosion in the aggressive environments of simulated body fluid is remarkably augmented. The barrier properties of the nitrided layer have been demonstrated through a reduction in metal ion release by as much as a factor of 2, 4, and 10 for Co, Cr, and Mo, respectively. (c) 2024 Author(s).
引用
收藏
页数:13
相关论文
共 50 条
  • [21] Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge
    Hecimovic, A.
    Burcalova, K.
    Ehiasarian, A. P.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (09)
  • [22] Research Review of the Plasma with Spoke Characteristic for High Power Impulse Magnetron Sputtering
    Li Yuge
    Liu Weiyang
    Lei Mingkai
    CHINA SURFACE ENGINEERING, 2022, 35 (01) : 1 - 9
  • [23] Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
    Aiempanakit, Montri
    Aijaz, Asim
    Lundin, Daniel
    Helmersson, Ulf
    Kubart, Tomas
    JOURNAL OF APPLIED PHYSICS, 2013, 113 (13)
  • [24] High power impulse magnetron sputtering and its applications
    Yuan, Yan
    Yang, Lizhen
    Liu, Zhongwei
    Chen, Qiang
    PLASMA SCIENCE & TECHNOLOGY, 2018, 20 (06)
  • [25] Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
    Aiempanakit, M. (monai@ifm.liu.se), 1600, American Institute of Physics Inc. (113):
  • [26] The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
    Gudmundsson, J. T.
    VACUUM, 2010, 84 (12) : 1360 - 1364
  • [27] On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge
    Rudolph, M.
    Revel, A.
    Lundin, D.
    Brenning, N.
    Raadu, M. A.
    Anders, A.
    Minea, T. M.
    Gudmundsson, J. T.
    PHYSICS OF PLASMAS, 2022, 29 (02)
  • [28] Metal filling by high power impulse magnetron sputtering
    Jablonka, Lukas
    Moskovkin, Pavel
    Zhang, Zhen
    Zhang, Shi-Li
    Lucas, Stephane
    Kubart, Tomas
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (36)
  • [29] High power impulse magnetron sputtering and its applications
    袁燕
    杨丽珍
    刘忠伟
    陈强
    Plasma Science and Technology, 2018, 20 (06) : 56 - 72
  • [30] Spokes in high power impulse magnetron sputtering plasmas
    Hecimovic, Ante
    von Keudell, Achim
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2018, 51 (45)