Synthesis of coplanar quaternary ammonium salts with excellent electrochemical properties based on an anthraquinone skeleton and their application in copper plating

被引:12
作者
Li, Xuyang [1 ,2 ]
Yin, Xinpeng [1 ,2 ]
Li, Jun [1 ,2 ]
Yuan, Bo [1 ,2 ]
Xiang, Chunyu [1 ,2 ]
Zou, Peikun [1 ,2 ]
Wang, Limin [1 ,2 ,3 ,4 ]
机构
[1] East China Univ Sci & Technol, Sch Chem & Mol Engn, Shanghai Key Lab Funct Mat Chem, 130 Meilong Rd, Shanghai 200237, Peoples R China
[2] East China Univ Sci & Technol, Inst Fine Chem, Sch Chem & Mol Engn, 130 Meilong Rd, Shanghai 200237, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Organ Chem, Key Lab Organofluorine Chem, 345 Lingling Rd, Shanghai 200032, Peoples R China
[4] East China Univ Sci & Technol, Dept Fine Chem, Meilong Rd 130, Shanghai 200237, Peoples R China
基金
中国国家自然科学基金;
关键词
Anthraquinone; Electrochemistry; Leveler; Copper electrodeposition; WAVE-FUNCTION; ELECTRODEPOSITION; PERFORMANCE; ADDITIVES; ADSORPTION; MECHANISM; CHLORIDE; FORMULA; HOST;
D O I
10.1016/j.electacta.2022.141541
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Through-hole copper deposition technology for nano-micro hole printed circuit boards (PCBs) is of great importance in the electronic industry. Achieving efficient copper electrodeposition using trace amounts of plating additives is a very challenging problem. Here, four anthraquinone (AQS) quaternary ammonium salts have been synthesised based on anthraquinone yellow pigments. These four compounds were functionalised for the first time as promising levelers for through-hole copper electrodeposition. Electrochemical tests, theoretical calculations and Molecular dynamics simulation demonstrate that the AQS-Qnl compounds have the most excellent copper deposition inhibition and electrode adsorption capacity among the four compounds. TP value measurement, SEM, XRD tests confirmed that AQS-Qnl can actually have high through-hole filling and excellent levelling performance in practical PCB plating. Based on this, The levelling mechanism of AQS-Qnl leveler was analysed by using electrostatic potential, average local ionisation energy and polarisation rate and the mechanism of AQS-Qnl's interaction with PEG and SPS in practical plating was proposed using galvanostatic measurements.
引用
收藏
页数:12
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