Diamond-like films of tetrahedral amorphous carbon deposited by anodic arc evaporation of graphite

被引:5
作者
Scheffel, Bert [1 ]
Zywitzki, Olaf [1 ]
Kopte, Torsten [1 ]
机构
[1] Fraunhofer Inst Organ Elekt Elektronenstrahl & Pla, Winterbergstr 28, D-01277 Dresden, Germany
关键词
Tetrahedral amorphous carbon; Ta-C; Diamond-like carbon; Anodic arc; Vacuum arc evaporation; Hollow cathode arc; VACUUM-ARC; RAMAN-SPECTRA; LASER-ARC; MODEL;
D O I
10.1016/j.surfcoat.2023.130305
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A physical vapor deposition process using anodic arc evaporation in combination with a hollow cathode arc discharge was applied to the evaporation of graphite for deposition of hydrogen-free carbon layers. The diamond-like carbon (DLC) films deposited on 100Cr6 steel substrates were investigated by nanoindentation, Raman spectrometry, FE-SEM, AFM and spectroscopic ellipsometry. The relationships between the process parameters and the coating properties are discussed. Coatings deposited without bias voltage at substrate temperatures <200 degrees C are very hard (61-75 GPa) with also very high Young's modulus (588-685 GPa). The evaluation of the Raman spectra indicated a high proportion of tetrahedral sp(3) bonds in the range of 70-88 %. Obviously, the vapor particle energies are high enough to achieve such high hardness values even without application of a bias voltage. The coatings proved to be completely droplet-free and have a very low surface roughness as confirmed by FE-SEM and AFM. The deposition rates in the range of 4-18 nm/s are exceptionally high for such tetrahedral amorphous carbon (ta-C) coatings, which is a good prerequisite for industrial applications. The ta-C layers with very high hardness and smooth surface are well suited as wear resistant layers.
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页数:7
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