Effect of pulse width on deposition of diamond-like carbon on high-power pulsed magnetron sputtering

被引：1

作者：

Ohta, Takayuki ^{[1
]}

Matsushima, Jo ^{[1
]}

Kunitsugu, Shinsuke ^{[2
]}

Oda, Akinori ^{[3
]}

Kousaka, Hiroyuki ^{[4
]}

机构：

[1] Meijo Univ, Dept Elect & Elect Engn, 1-501,Shiogamaguchi,Tempaku Ku, Nagoya 4688502, Japan

[2] Ind Technol Ctr, 5301,Haga,Kita Ku, Okayama 7011296, Japan

[3] Chiba Inst Technol, Dept Elect & Elect Engn, 2-17-1 Tsudanuma, Narashino 2750016, Japan

[4] Gifu Univ, Dept Mech Engn, 1-1 Yanagido, Gifu 5011193, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2023年 / 62卷 / SL期

关键词：

sputtering; diamond-like carbon; high-power pulsed magnetron sputtering; SUPER-LOW-FRICTION; COATINGS; TRIBOLOGY; FILMS;

D O I：

10.35848/1347-4065/acd703

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A diamond-like carbon (DLC) film was deposited using high-power pulsed magnetron sputtering. The effect of pulse width on the deposition of DLC film was investigated under constant peak power density or average power density to clarify the densification mechanism of DLC film. The maximum hardness of 25 GPa analyzed by nanoindentation was obtained using Ar gas without negative substrate bias voltage at pulse width 30 & mu;s and a peak power density of 1.5 kW cm(-2). The flux and energy of C+ and Ar+ incident to the DLC film was evaluated by using energy-resolved and time-resolved mass spectrometry to clarify the relation between the input power to the target and the behavior of produced ions. The change in hardness is well correlated with the ion flux ratio C+/Ar+. This result indicates that a flux and energy of Ar+ as well as C+ is a key parameter to characterize the microstructure of DLC film.

引用

页数：8

共 44 条

[1] An updated overview of diamond-like carbon coating in tribology [J].