A covalency-aided electrochemical mechanism for CO2 reduction: the synergistic effect of copper and boron dual active sites drives the formation of a high-efficiency ethanol product

被引:1
|
作者
Wang, Shiyan [1 ,2 ]
Wang, Longlu [1 ,2 ]
Zhu, Xianjun [1 ,2 ]
Zhuang, Yanling [1 ,2 ]
Niu, Xianghong [3 ]
Zhao, Qiang [1 ,2 ]
机构
[1] Nanjing Univ Posts & Telecommun, Coll Elect & Opt Engn, Nanjing 210023, Peoples R China
[2] Nanjing Univ Posts & Telecommun, Coll Flexible Elect Future Technol, Nanjing 210023, Peoples R China
[3] Nanjing Univ Posts & Telecommun, Coll Sci, Nanjing 210023, Peoples R China
关键词
INITIO MOLECULAR-DYNAMICS; DENSITY-FUNCTIONAL THEORY; CARBON-DIOXIDE; CU; MULTICARBON; CONVERSION; SELECTIVITY; PH; ELECTROREDUCTION; INTERFACES;
D O I
10.1039/d3nr04288j
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Electrocatalytic carbon dioxide (CO2) conversion into high-value multi-carbon products is of great significance for CO2 utilization, but the chemical inertness, low yields, and poor product selectivity hinder the application prospects of the electrocatalytic conversion methods. In this work, a covalency-aided electrochemical mechanism for CO2 reduction is proposed for the first time by embedding the nonmetallic element boron (B) on copper surfaces, in which p-block dopants have a significant impact on modifying the adsorbent intermediates and improving the catalytic activity. Herein, B atoms not only provide empty and occupied orbitals to adsorb and activate CO, but also afford a large amount of charge to stabilize the C-2 intermediates. In addition, B atoms can also adjust the oxidation state of nearby copper (namely, Cu+), and the synergistic Cu+ and B dual active sites act as O* adsorption and C* adsorption sites, respectively, leading to strong adsorption and activation of CO2. First-principles calculations reveal that CO2 can be reduced into C2H5OH with an ultralow potential of -0.26 V. Overall, this study provides new insights into CO2 reduction, which offers a promising way for achieving an efficient ethanol product.
引用
收藏
页码:17776 / 17784
页数:9
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