X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films

被引：3

作者：

Bras, Patrice ^{[1
]}

Morawe, Christian ^{[1
]}

Laboure, Sylvain ^{[1
]}

Perrin, Francois ^{[1
]}

Vivo, Amparo ^{[1
]}

Barrett, Raymond ^{[1
]}

机构：

[1] ESRF European Synchrotron, Xray Opt Grp, 71 Ave Martyrs, Grenoble, France

来源：

JOURNAL OF SYNCHROTRON RADIATION | 2023年 / 30卷

关键词：

X-ray optics; figure correction; differential deposition; surface roughness; film stress; off-line metrology; Fizeau stitching; long trace profiler; magnetron sputtering;

D O I：

10.1107/S1600577523003697

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calculated using a deconvolution algorithm. The surface figure was characterized using conventional off-line visible-light metrology instrumentation (long trace profiler and Fizeau interferometer) before and after the deposition. WSi2 was revealed to be a promising candidate material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm-long flat Si mirror the average height errors were reduced by a factor of 20 down to 0.2 nm root mean square. This result shows the suitability of WSi2 for differential deposition. Potential promising applications include the upgrade of affordable, average-quality substrates to the standards of modern synchrotron beamlines.

引用

页码：708 / 716

页数：9

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