Simple spatially resolved period measurement of chirped pulse compression gratings

被引:3
作者
Bienert, Florian [1 ]
Roecker, Christoph [1 ]
Graf, Thomas [1 ]
Ahmed, Marwan Abdou [1 ]
机构
[1] Univ Stuttgart, Inst Strahlwerkzeuge IFSW, Pfaffenwaldring 43, D-70569 Stuttgart, Germany
基金
欧盟地平线“2020”;
关键词
GROOVE DENSITY; ACCURATE;
D O I
10.1364/OE.489238
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present an easy-to-implement and low-cost setup for the precise measurement of the period chirp of diffraction gratings offering a resolution of 15 pm and reasonable scan speeds of 2 seconds per measurement point. The principle of the measurement is illustrated on the example of two different pulse compression gratings, one fabricated by laser interference lithography (LIL) and the other by scanning beam interference lithography (SBIL). A period chirp of 0.22 pm/mm2 at a nominal period of 610 nm was measured for the grating fabricated with LIL, whereas no chirp was observed for the grating fabricated by SBIL, which had a nominal period of 586.2 nm.
引用
收藏
页码:19392 / 19403
页数:12
相关论文
共 43 条
[1]   The Nexawatt: A Strategy for Exawatt Peak Power Lasers Based on NIF and NIF-like Beam Lines [J].
Barty, C. P. J. .
9TH INTERNATIONAL CONFERENCE ON INERTIAL FUSION SCIENCES AND APPLICATIONS (IFSA 2015), 2016, 717
[2]   General mathematical model for the period chirp in interference lithography [J].
Bienert, Florian ;
Graf, Thomas ;
Ahmed, Marwan Abdou .
OPTICS EXPRESS, 2023, 31 (04) :5334-5346
[3]   Comprehensive theoretical analysis of the period chirp in laser interference lithography [J].
Bienert, Florian ;
Graf, Thomas ;
Ahmed, Marwan Abdou .
APPLIED OPTICS, 2022, 61 (09) :2313-2326
[4]   Diffraction gratings: from principles to applications in high-intensity lasers [J].
Bonod, Nicolas ;
Neauport, Jerome .
ADVANCES IN OPTICS AND PHOTONICS, 2016, 8 (01) :156-199
[5]   An imaging grating diffractometer for traceable calibration of grating pitch in the range 20 μm to 350 nm [J].
Brasil, D. A. ;
Alves, J. A. P. ;
Pekelsky, J. R. .
3RD INTERNATIONAL CONGRESS ON MECHANICAL METROLOGY (CIMMEC2014), 2015, 648
[6]   IN-SITU END-POINT DETECTION DURING DEVELOPMENT OF SUBMICROMETER GRATING STRUCTURES IN PHOTORESIST [J].
BRITTEN, JA ;
BOYD, RD ;
SHORE, BW .
OPTICAL ENGINEERING, 1995, 34 (02) :474-479
[7]  
Chen C. G., 2004, J VAC SCI TECHNOL, P1
[8]  
Chen C.G., 2003, Beam alignment and image metrology for scanning beam interference lithography - fabricating gratings with nanometer phase accuracy
[9]   Nanometer-accurate grating fabrication with scanning beam interference lithography [J].
Chen, CG ;
Konkola, PT ;
Heilmann, RK ;
Joo, C ;
Schattenburg, ML .
NANO- AND MICROTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS, 2002, 4936 :126-134
[10]   Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy [J].
Chernoff, Donald A. ;
Buhr, Egbert ;
Burkhead, David L. ;
Diener, Alexander .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2, 2008, 6922 (1-2)