Effect of annealing temperature on the structural and opto-electrical properties of TiO2 thin films on AZO glass substrates by magnetron sputtering

被引：0
作者：
Wang, Xiaojing [1 ,2 ]
Wang, Shengxiang [1 ,2 ]
Zhu, Dengyu [1 ,2 ]
Huang, Xiaoli [3 ]
机构：
[1] Wuhan Text Univ, Sch Elect & Elect Engn, Wuhan 430074, Peoples R China
[2] Wuhan Text Univ, Hubei Engn & Technol Res Ctr Funct Fiber Fabricat, Wuhan 430074, Peoples R China
[3] Hubei Photovolta Engn Technol Res Ctr, Wuhan 430074, Peoples R China
来源：
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 2023年 / 25卷 / 11-12期
关键词：
TiO2; Thin films; Structures; Optical and electrical properties; Sputtering; LAYER;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
TiO2 thin films were prepared on the AZO glass substrates by magnetron sputtering. The effect of annealing temperature on the structural, optical and electrical properties of TiO2 thin films was investigated. The results show that the structures of TiO2 thin films are closely related to annealing temperatures. The TiO2 thin film annealed at 400 degrees C is amorphous; the anatase TiO2 is obtained by annealing at 500 degrees C, whereas a rutile and anatase polymorph of TiO2 is obtained when the TiO2 thin film is annealed at 600 degrees C The grain of TiO2 thin film annealed at 600 degrees C is spherical and the grain sizes are tens of nanometers. The optical and electrical pragitios of TIO thin films on AZO glass substrates get worse than the AZO glass itself. The average transmittance of TiO Abstr films annealed at 400 degrees C, 500 degrees C and 600 degrees C is about 74.4%, 69.1% and 71.8% in the range of 400-800 nm. The sheet stances of TiO2 thin films on AZO substrates annealed at 400 degrees C, 500 degrees C and respectively. 600 degrees C are about 45 Omega/Gamma, 36 Omega/Gamma and 23 Omega/Gamma respectively.
引用
收藏
页码：594 / 598
页数：5
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