Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths

被引:0
|
作者
Brose, Sascha [1 ,2 ,3 ]
Danylyuk, Serhiy [1 ,2 ,3 ]
Luettgenau, Bernhard [1 ,2 ]
Gisch, Ismael [1 ,2 ]
Lohmann, Lars [1 ,2 ]
Stollenwerk, Jochen [1 ,2 ,3 ]
Holly, Carlo [1 ,2 ,3 ]
机构
[1] Rhein Westfal TH Aachen, Chair Technol Opt Syst, Steinbachstr 15, D-52074 Aachen, Germany
[2] JARA Fundamentals Future Informat Technol, Julich, Germany
[3] Fraunhofer Inst Laser Technol, Steinbachstr 15, D-52074 Aachen, Germany
关键词
inline plasma diagnostics; phase-shifting masks; transmission gratings; discharge-produced plasma; laser-produced plasma; extreme ultraviolet; source metrology; thin film filters; interference lithography; spectroscopy; SCATTERING; PLASMA; XUV;
D O I
10.1117/12.2683682
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this contribution the design, realization, and characterization of a transmission grating spectrograph (TGS) designed for spectral characterization and monitoring tasks at extreme-ultraviolet (EUV) wavelengths are presented. The overall dimensions of the EUV-TGS have been minimized to allow for easy integration in existing beamlines and setups while maintaining sub-Angstrom spectral resolution. The main module (length = 40 mm) of the realized EUV- TGS consists of a spectral and a spatial filter and a high-resolution phase-shifting transmission grating with a grating structure periodicity of 80 nm. For spectral characterization and monitoring of a plasma-based EUV radiation source, a two-dimensional detector is positioned in close proximity to the main module. The realized spectrograph prototype can be moved in and out of the beam path, and therefore does not affect spot profiling and general beam alignment tasks. The structural and optical design and performance measurements of the EUV-TGS are presented, demonstrating that this ultra-compact spectrograph can be easily integrated into EUV setups that will benefit from an inline diagnostic option.
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页数:9
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