Alleviation of Cadmium Toxicity by Nano-silicon Dioxide in Momordica charantia L. Seedlings

被引:12
|
作者
Sun, Hongyan [1 ]
He, Songjie [1 ,2 ]
Liu, Tingli [1 ]
Zhang, Qingmei [2 ]
Yu, Jia [1 ]
Gao, Yifan [1 ]
Wang, Xiaoyun [3 ]
机构
[1] Taiyuan Univ Sci & Technol, Sch Environm & Resources, Taiyuan 030024, Peoples R China
[2] Taiyuan Univ Sci & Technol, Coll Appl Sci, Taiyuan 030024, Peoples R China
[3] Shanxi Agr Univ, Inst Soil & Water Conservat, Taiyuan 030045, Peoples R China
基金
中国国家自然科学基金;
关键词
Antioxidant capacity; Cd concentration; Photosynthesis; Flavonoids; Oxidative stress; Soluble sugar; TRITICUM-AESTIVUM L; CUCUMIS-SATIVUS; DROUGHT STRESS; NANOPARTICLES; SELENIUM; COMPARTMENTATION; TOLERANCE;
D O I
10.1007/s42729-022-01103-4
中图分类号
Q94 [植物学];
学科分类号
071001 ;
摘要
Heavy metal cadmium (Cd) is a toxic element which poses a great threat to environment and human health; nanomaterials are emerging materials with great potential in promoting plant growth and improving crop stress resistance. The main purpose of the current study was to investigate the mitigation effects of nano-silicon dioxide (nSiO(2)) on Cd toxicity to Momordica charantia L. (bitter gourd) seedlings. We conducted hydroponic experiments on bitter gourd seedlings grown under control and Cd toxicity (50 mu mol L-1) and Cd combined with 10 (nSi10) and 30 (nSi30) mg L-1 of Si in form of nSiO(2) soliquid applied on the 5(th) day after transplanting. Exogenous application of nSiO(2) increased Cd stress tolerance in bitter gourd by enhancing chlorophyll content, photosynthetic rate (Pn), transpiration rate (Tr), and stomatal conductance (Gs) and promoted certain antioxidant response by increasing leaf/root SOD, root APX, peroxidase (POD), and catalase (CAT) activities and depressed flavonoids and soluble sugar contents under Cd stress. Furthermore, Cd-stressed plants displayed an upper level of malondialdehyde (MDA) (1.71-, 1.45-, and 1.53-fold in the leaves, stems, and roots, respectively), while nSiO(2) improved membranous integrity through abating MDA contents in all tissues. Additionally, nSiO(2) improved Cd-treated plant growth (plant height, leaf area, plant dry weight (DW), plant fresh weight (FW)), diminished Cd concentration in all plant tissues, and application of 30 mg L-1 nSiO(2) (Cd+nSi30) reduced stem and root Cd concentration by 7.3%, and 33.8%, respectively, as compared with respective Cd-exposed alone. The study suggested that the use of nSiO(2) may be a tool for reducing the Cd toxicity in bitter gourd and declining its concentration in plants. Cd toxicity reduced growth and productivity of bitter gourd seedlings. However, application of nSiO(2) was effective in enhancing the physiological performance, photosynthesis, and plant growth of bitter gourd under Cd stress condition. Therefore, nSiO(2) may, in future, find value as a potential plant growth stimulant under Cd stress.
引用
收藏
页码:1060 / 1069
页数:10
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