Amorphous shear band formation in elemental β-boron

被引:0
作者
Guo, Tingwei [1 ]
Shen, Yidi [2 ]
Zhang, Haibo [1 ]
Lahkar, Simanta [1 ,3 ]
Zhang, Zhifu [1 ]
Song, Shuangxi [1 ]
An, Qi [2 ]
Reddy, Kolan Madhav [1 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China
[2] Iowa State Univ, Dept Mat Sci & Engn, Ames, IA 50011 USA
[3] Eindhoven Univ Technol, Dept Elect Engn, NL-5612 AP Eindhoven, Netherlands
基金
美国国家科学基金会;
关键词
Boron; Amorphization; Dislocation; Transmission electron microscopy; Density functional theory; PRESSURE-INDUCED AMORPHIZATION; DEFORMATION; NANOINDENTATION; PLASTICITY; CHEMISTRY; SILICON; PHYSICS; SOLIDS;
D O I
10.1016/j.matchar.2024.113684
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the formation of shear-induced amorphization in elemental beta-boron (beta-B) using transmission electron microscopy (TEM) and density function theory (DFT) simulations. TEM observations beneath the residual indentation of beta-B revealed intragranular nanoscale shear bands along (111) and (111) crystallographic planes, which are preceded by nucleation of dislocations. Strain map analyses of the shear band indicated that compressive strain assists in the process of bond breaking and shear strain is involved in the disassembly of icosahedral clusters by forming amorphization within a unit cell of beta-B. Further DFT simulations confirmed that the deconstruction of triply fused icosahedral (B28) along [110](111) slip system in beta-B106 has the lowest shear strength leading to the formation of a kink followed by amorphization, which is in line with our experimental observations. This study illustrates the structural evolution of shear amorphization in beta-B and provides the basis to improve their mechanical properties through modification of internal structure.
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页数:9
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