Solution-Route Inkjet Fabrication of CeO2 Thin Films with Tunable Microstructure

被引:0
作者
Singh, Veena [1 ]
Belova, Lyubov [1 ]
机构
[1] KTH Royal Inst Technol, Dept Mat Sci & Engn, SE-10044 Stockholm, Sweden
关键词
CeO2; inkjet printing; microstructure; thin films; OXIDE-FILMS; CERIA; DEPOSITION; ELECTRODE;
D O I
10.3390/ma16041685
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report the fabrication and characterization of solution-route CeO2 thin films with a tunable porosity and microstructure. Films were deposited by means of inkjet printing technique using 0.2 M, 0.4 M and 0.6 M concentration inks prepared from Ce(NO3)(3)center dot 6H(2)O precursor. Printing was performed at two different temperatures of 60 degrees C and 300 degrees C to study the variation in structure. Printing parameters were adjusted for the consecutive deposition of layers, resulting in approximate to 140 nm and approximate to 185 nm thick single layers for 60 degrees C and 300 degrees C printing temperatures, respectively. We compared the microstructure of printed films for different concentrations, printing temperatures, solvents and substrates. The formation of the cubic fluorite structure of the printed films was confirmed via XRD characterization. We suggest this technique as an advanced method for high-quality film fabrication with a controlled microstructure and with a minimal waste of materials. Through adjusting printing parameters, both dense and porous films can be produced for use in different applications.
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页数:10
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