Effect of low-temperature annealing on electrical resistivity and mechanical properties of laser-powder bed fused AlSi10Mg alloy

The AlSi10Mg sample was additive-manufactured using laser powder bed fusion (L-PBF), and subsequent low-temperature annealing (LTA) at 413K or 473 K was applied. Vickers hardness tests show the peak at around 160 HV by 473 K annealing and around 145 HV by 413 K annealing. The flow stress of tensile and compression deformations are also affected by LTA, and peak aging condition gives the highest 0.2% proof stress. 0.2% proof stress obtained by tensile tests is around 270 MPa, whereas that obtained by compression tests is between 326 MPa and 386 MPa. Electrical resistivity at 293 K changes from approximately 80 n omega m down to around 60 n omega m, whereas that at 77 K changes from around 40 n omega m down to around 20 n omega m. The estimated concentration of solute Si in the as-built specimen is between 2.5 mass% and 2.9 mass%, corresponding to the previous results using energy-dispersive X-ray spectroscopy. The lattice constant obtained from XRD increased from 0.4043 nm up to 0.4048 nm by LTA. Both electrical resistivity and XRD measurement indicate a decrease in the concen-tration of solute atoms. Microstructure observations revealed numerous nano-sized precipitates of Si phase with a plate-like or granular morphologies in alpha-Al grains due to LTA.