Low-Temperature Growth of ZnMgO Thin Films by Atmospheric Spin-Coating Using Diethylzinc Solution

被引:2
作者
Yoshino, Kenji [1 ]
Tominaga, Himeka [1 ]
Komaki, Yuta [1 ]
Imai, Masato [1 ]
Higashi, Tomohiro [2 ]
Minemoto, Takashi [3 ]
Shen, Qing [4 ]
Hayase, Shuzi [5 ]
机构
[1] Univ Miyazaki, Dept Elect & Elect Engn, Miyazaki 8892192, Japan
[2] Univ Miyazaki, Inst Tenure Track Promot, Miyazaki 8892192, Japan
[3] Ritsumeikan Univ, Dept Elect & Elect Engn, Shiga 5258577, Japan
[4] Univ Electrocommun, Dept Engn Sci, Chofu, Tokyo 1828585, Japan
[5] Univ Electrocommun, i Powered Energy Syst Res Ctr, Chofu, Tokyo 1828585, Japan
关键词
ZnMgO; spin coating; diethylzinc; XRD; SEM; AFM;
D O I
10.1007/s11664-023-10475-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Non-doped ZnMgO thin film deposited at room temperature on a white glass using a diethylzinc-based solution grown by atmospheric conventional spin coating was annealed at 150 degrees C. The sample had an average optical transmittance of more than 85% in the visible region, and a-axis orientation hexagonal polycrystal, a dense crystal, and a flat surface. Moreover, the n-type sample was obtained from the predominant zinc interstitial caused by x-ray photoemission spectroscopy. A sample had a resistivity of 14 x 10(6) Omega cm, carrier concentration of 3.9 x 10(11) cm(-3), and mobility of 5.0 cm(2) (Vs)(-1). [GRAPHICS] .
引用
收藏
页码:5134 / 5139
页数:6
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