First-Principles Investigation of Near-Surface Divacancies in Silicon Carbide

被引:1
|
作者
Zhu, Yizhi [1 ]
Yu, Victor Wen-zhe [2 ]
Galli, Giulia [1 ,2 ,3 ]
机构
[1] Univ Chicago, Pritzker Sch Mol Engn, Chicago, IL 60637 USA
[2] Argonne Natl Lab, Mat Sci Div, Lemont, IL 60439 USA
[3] Univ Chicago, Dept Chem, Chicago, IL 60637 USA
关键词
Point defects; surfaces; quantum sensing; first-principles calculations; ELECTRON-AFFINITY; RAMAN-SCATTERING; SI; 3C; PHOTOLUMINESCENCE; PASSIVATION; GROWTH; SPECTROSCOPY; TERMINATION; GRAPHENE;
D O I
10.1021/acs.nanolett.3c02880
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The realization of quantum sensors using spin defects in semiconductors requires a thorough understanding of the physical properties of the defects in the proximity of surfaces. We report a study of the divacancy (VSiVC) in 3C-SiC, a promising material for quantum applications, as a function of surface reconstruction and termination with -H, -OH, -F and oxygen groups. We show that a VSiVC close to hydrogen-terminated (2 x 1) surfaces is a robust spin-defect with a triplet ground state and no surface states in the band gap and with small variations of many of its physical properties relative to the bulk, including the zero-phonon line and zero-field splitting. However, the Debye-Waller factor decreases in the vicinity of the surface and our calculations indicate it may be improved by strain-engineering. Overall our results show that the VSiVC close to SiC surfaces is a promising spin defect for quantum applications, similar to its bulk counterpart.
引用
收藏
页码:11453 / 11460
页数:8
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