Design, Fabrication, and Test of 4H-SiC Accelerometer

被引:0
|
作者
Yang, Yu [1 ]
Zhao, You [1 ]
Wang, Lukang [1 ]
Wang, Yabing [1 ]
Zhao, Yulong [1 ]
机构
[1] Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Peoples R China
来源
2023 IEEE SENSORS | 2023年
关键词
Silicon carbide; accelerometer; MEMS; laser fabrication;
D O I
10.1109/SENSORS56945.2023.10324947
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
Silicon carbide (SiC) is a promising material to fabricate MEMS accelerometers used in extreme environments. Due to the difficulties of processing bulk SiC materials and the complex structure of accelerometers, studies on SiC accelerometers are still insufficient. In this study, we designed a single-beam accelerometer based on 4H-SiC. The traditional MEMS process is used to fabricate the piezoresistors and electrodes. The femtosecond laser etching is used to thin the cantilever beam and release the proof mass. Static and dynamic tests of the accelerometer were carried out. The zero-g output remained stable in one one-hour test. The sensitivity of the accelerometer was 0.099 mV/g in the +/- 1 g static earth gravity test, and the nonlinearity of the sensor was calculated to be 0.34%. The dynamic testing of the sensor showed that the designed sensor can accurately identify the vibration frequency and
引用
收藏
页数:4
相关论文
共 50 条
  • [41] Fabrication of 4H-SiC merged PN-Schottky diodes
    Zhang, Y.M., 2001, Science Press (22):
  • [42] Fabrication and Testing of 4H-SiC MESFETs for Analog Functions Circuits
    Devie, Arnaud
    Tournier, Dominique
    Godignon, Philippe
    Vellvehi, Miquel
    Montserrat, Josep
    Jorda, Xavier
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 1159 - +
  • [43] Fabrication of uniform 4H-SiC mesopores by pulsed electrochemical etching
    Tan, Jia-Hui
    Chen, Zhi-zhan
    Lu, Wu-Yue
    Cheng, Yue
    He, Hong
    Liu, Yi-Hong
    Sun, Yu-Jun
    Zhao, Gao-Jie
    NANOSCALE RESEARCH LETTERS, 2014, 9
  • [44] Dose designing and fabrication of 4H-SiC double RESURF MOSFETs
    Noborio, M.
    Suda, J.
    Kimoto, T.
    PROCEEDINGS OF THE 18TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & ICS, 2006, : 273 - +
  • [45] Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
    Chen Fengping
    Zhang Yuming
    Lue Hongliang
    Zhang Yimen
    Guo Hui
    Guo Xin
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (06)
  • [46] Ion implantation -: Tool for fabrication of advanced 4H-SiC devices
    Kalinina, EV
    Kholujanov, G
    Gol'dberg, Y
    Blank, T
    Onushkin, G
    Strel'chuk, A
    Violina, G
    Kossov, V
    Yafaev, R
    Hallén, A
    Konstantinov, A
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 835 - 838
  • [47] Oxidation process by RTP for 4H-SiC MOSFET gate fabrication
    Constant, A.
    Camara, N.
    Montserrat, J.
    Pauses, E.
    Camassel, J.
    Godignon, P.
    SILICON CARBIDE AND RELATED MATERIALS 2010, 2011, 679-680 : 500 - +
  • [48] Effect of P plus region design on the fabrication of 6500 V 4H-SiC JBS diodes
    Sang, Ling
    Tian, Lixin
    Li, Jialin
    Niu, Yingxi
    Jin, Rui
    JOURNAL OF CRYSTAL GROWTH, 2020, 530
  • [49] Design methodologies and fabrication of 4H-SiC lateral Schottky barrier diode on thin RESURF layer
    Shimbori, Atsushi
    Huang, Alex Q.
    APPLIED PHYSICS LETTERS, 2022, 120 (12)
  • [50] Divacancy in 4H-SiC
    Son, NT
    Carlsson, P
    ul Hassan, J
    Janzén, E
    Umeda, T
    Isoya, J
    Gali, A
    Bockstedte, M
    Morishita, N
    Ohshima, T
    Itoh, H
    PHYSICAL REVIEW LETTERS, 2006, 96 (05)