Simultaneous Measurement of Group Refractive Index Dispersion and Thickness of Fused Silica Using a Scanning White Light Interferometer

被引：1

作者：

Lee, Heesu ^{[1
]}

Hwang, Seungjin ^{[2
]}

Kong, Hong Jin ^{[3
,4
]}

Hong, Kyung Hee ^{[4
]}

Yu, Tae Jun ^{[1
,2
,4
]}

机构：

[1] Handong Global Univ, Dept Comp Sci & Elect Engn, Pohang 37554, South Korea

[2] HIL Lab Inc, Pohang 37563, South Korea

[3] Korea Adv Inst Sci & Technol, Dept Phys, Daejeon 34141, South Korea

[4] Handong Global Univ, Dept Adv Convergence, Pohang 37554, South Korea

来源：

SENSORS | 2024年 / 24卷 / 01期

基金：

新加坡国家研究基金会;

关键词：

white light interferometer; scanning white light interferometer; group refractive index dispersion; thickness; fused silica; CHIRPED-PULSE AMPLIFICATION; LASER-PULSES; DOMAIN;

D O I：

10.3390/s24010017

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

In this study, we simultaneously measured the group refractive index dispersion and thickness of fused silica using a scanning white light interferometer on a spectral range from 800 to 1050 nm. A delay error correction was performed using a He-Ne laser. The accuracy of the measured group refractive index dispersion of fused silica, when compared to the temperature-dependent Sellmeier equation, is within 4 x 10-5.

引用

页数：11

共 19 条

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