A Study of Al2O3/MgO Composite Films Deposited by FCVA for Thin-Film Encapsulation

被引：3

作者：

Yuan, Heng ^{[1
,2
]}

Zhang, Yifan ^{[1
,2
]}

Li, Qian ^{[1
,2
]}

Yan, Weiqing ^{[1
,2
]}

Zhang, Xu ^{[1
,2
]}

Ouyang, Xiao ^{[1
,2
]}

Ouyang, Xiaoping ^{[1
,2
]}

Chen, Lin ^{[2
]}

Liao, Bin ^{[1
,2
]}

机构：

[1] Beijing Normal Univ, Coll Nucl Sci & Technol, Beijing 100875, Peoples R China

[2] Beijing Normal Univ Zhuhai, Adv Inst Nat Sci, Zhuhai 519087, Peoples R China

来源：

MATERIALS | 2023年 / 16卷 / 05期

基金：

中国国家自然科学基金; 中国博士后科学基金;

关键词：

FCVA; Al2O3; MgO; thin-film encapsulation; ATOMIC LAYER DEPOSITION; OPTICAL-PROPERTIES; MORPHOLOGY; BARRIER; PERMEATION; MECHANISMS; DEFECTS;

D O I：

10.3390/ma16051955

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Al2O3 and MgO composite (Al2O3/MgO) films were rapidly deposited at low temperatures using filtered cathode vacuum arc (FCVA) technology, aiming to achieve good barrier properties for flexible organic light emitting diodes (OLED) thin-film encapsulation (TFE). As the thickness of the MgO layer decreases, the degree of crystallinity decreases gradually. The 3:2 Al2O3:MgO layer alternation type has the best water vapor shielding performance, and the water vapor transmittance (WVTR) is 3.26 x 10(-4) g center dot m(-2)center dot day(-1) at 85 degrees C and 85% R.H, which is about 1/3 of that of a single layer of Al2O3 film. Under the action of ion deposition, too many layers will cause internal defects in the film, resulting in decreased shielding ability. The surface roughness of the composite film is very low, which is about 0.3-0.5 nm depending on its structure. In addition, the visible light transmittance of the composite film is lower than that of a single film and increases with the increase in the number of layers.

引用

页数：13