Potential of E-beam lithography for micro- and nano-optics fabrication on large areas

被引：12

作者：

Zeitner, Uwe D. ^{[1
,2
]}

Banasch, Michael ^{[3
]}

Trost, Marcus ^{[1
]}

机构：

[1] Fraunhofer Inst Appl Opt & Precis Engn, Jena, Germany

[2] Univ Appl Sci Munich, Inst Appl Phys, Munich, Germany

[3] Vistec Electron Beam GmbH, Jena, Germany

来源：

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | 2023年 / 22卷 / 04期

关键词：

electron-beam lithography; optical micro- and nano-structures; gratings; computer-generated holograms; optical meta-structures;

D O I：

10.1117/1.JMM.22.4.041405

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The availability of high-resolution and high-throughput lithographic fabrication technologies, such as electron-beam lithography, based on variable shaped beam writing and character projection opens the way for the flexible use of various optical nano-structures for some of the most demanding applications. We discuss the technical features, advantages, and limitations of these pattering approaches and show how they can favorably be combined to realize optical nano-structures for applications, which are as diverse as gratings for ultra-short laser pulses or high-resolution spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses and gratings), or UV-polarizers.

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