共 26 条
- [21] Influence of focus variation on linewidth measurements [J]. Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 : 144 - 155
- [22] Tilted beam SEM, 3D metrology for industry [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII, 2019, 10959
- [23] Monte Carlo modeling of secondary electron imaging in three dimensions [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXI, PTS 1-3, 2007, 6518
- [24] A simulation study of repeatability and bias in the CD-SEM [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2, 2003, 5038 : 138 - 149
- [26] Addressing FinFET metrology challenges in 1x node using tilt-beam critical dimension scanning electron microscope [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (04):