Role of dimensionality and size in controlling the drag Seebeck coefficient of doped silicon nanostructures: A fundamental understanding

被引:6
作者
Sen, Raja [1 ]
Vast, Nathalie [1 ]
Sjakste, Jelena [1 ]
机构
[1] Inst Polytech Paris, CNRS, Ecole Polytech, Lab Solides Irradies,CEA,DRF,IRAMIS, F-91120 Palaiseau, France
关键词
PHONON DRAG; THERMOELECTRIC-POWER; NANOWIRES;
D O I
10.1103/PhysRevB.108.L060301
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this theoretical Letter, we examine the influence of dimensionality, size reduction, and heat-transport direction on the phonon-drag contribution to the Seebeck coefficient of silicon nanostructures. Phonon-drag contribution, which arises from the momentum transfer between out-of-equilibrium phonon populations and charge carriers, significantly enhances the thermoelectric coefficient. Our implementation of the phonon-drag term accounts for the anisotropy of nanostructures, such as thin films and nanowires through the boundary-and momentum-resolved phonon lifetime. Our approach also takes into account the spin-orbit coupling, which turns out to be crucial for hole transport. We reliably quantify the phonon-drag contribution at various doping levels, temperatures, and nanostructure geometries for both electrons and holes in silicon nanostructures. Our results support the recent experimental findings, showing that a part of phonon-drag contribution survives in 100-nm silicon nanostructures.
引用
收藏
页数:6
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