Room-Temperature Quantum Diodes with Dynamic Memory for Neural Logic Operations

被引:1
作者
Kumar, Mohit [1 ,2 ]
Park, Jiyeong [1 ]
Kim, Junmo [1 ]
Seo, Hyungtak [1 ,2 ]
机构
[1] Ajou Univ, Dept Energy Syst Res, Suwon 16499, South Korea
[2] Ajou Univ, Dept Mat Sci & Engn, Suwon 16499, South Korea
基金
新加坡国家研究基金会;
关键词
ferroelectric; quantum tunneling; diodes; neural logic; room temperature; NEGATIVE DIFFERENTIAL RESISTANCE; THIN-FILM; FERROELECTRICITY; MECHANISMS;
D O I
10.1021/acsami.3c13031
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The pursuit of high-performance, next-generation nanoelectronics is fundamentally reliant on exploiting quantum phenomena such as tunneling at room temperature. However, quantum tunneling and memory dynamics are governed by two conflicting parameters: the presence or absence of defects. Therefore, the integration of both attributes within a single device presents substantial challenges. Nevertheless, successful integration has the potential to prompt crucial breakthroughs by emulating biobrain-like dynamics, in turn enabling sophisticated in-material neural logic operations. In this work, we demonstrate that a conformal nanolaminate HfO2/ZrO2 structure on silicon enables high-performing (>10(6) s) Fowler-Nordheim tunneling at room temperature. In addition, the device exhibits unipolar dynamic hysteresis loop opening (on/off ratio >10(2)) with high endurance (>10(4) cycles) along with negative differential resistance, which is attributed to the collective ferroelectric and capacitive effects and is utilized to emulate synaptic functions. Further, proof-of-concept logic gates based on voltage-dependent plasticity and time-domain were developed using a single device, offering in-material neural-like data processing. These findings pave the way for the realization of high-performing and scalability tunneling devices in advanced nanoelectronics, which mark a promising route toward the development of next-generation, fundamental neural logic computing systems.
引用
收藏
页码:56003 / 56013
页数:11
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