Probing the Reactivity of ZnO with Perovskite Precursors

被引:5
|
作者
Apergi, Sofia [1 ,2 ]
Brocks, Geert [1 ,2 ,3 ,4 ]
Tao, Shuxia [1 ,2 ]
Olthof, Selina [5 ]
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, Mat Simulat & Modelling, NL-5600 MB Eindhoven, Netherlands
[2] Eindhoven Univ Technol, Dept Appl Phys, Ctr Computat Energy Res, NL-5600 MB Eindhoven, Netherlands
[3] Univ Twente, Fac Sci & Technol, Computat Chem Phys, NL-7500 AE Enschede, Netherlands
[4] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
[5] Univ Cologne, Inst Phys Chem, D-50939 Cologne, Germany
关键词
metal oxide; XPS; ZnO; perovskite; DFT; reactivity; interface; ZINC-OXIDE; PHOTOELECTRON-SPECTROSCOPY; PARTIAL DISSOCIATION; HALIDE PEROVSKITES; AUGER PARAMETER; POLAR SURFACES; WORK FUNCTION; NICKEL-OXIDE; EFFICIENT; STABILITY;
D O I
10.1021/acsami.4c01945
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To achieve more stable and efficient metal halide perovskite devices, optimization of charge transport materials and their interfaces with perovskites is crucial. ZnO on paper would make an ideal electron transport layer in perovskite devices. This metal oxide has a large bandgap, making it transparent to visible light; it can be easily n-type doped, has a decent electron mobility, and is thought to be chemically relatively inert. However, in combination with perovskites, ZnO has turned out to be a source of instability, rapidly degrading the performance of devices. In this work, we provide a comprehensive experimental and computational study of the interaction between the most common organic perovskite precursors and the surface of ZnO, with the aim of understanding the observed instability. Using X-ray photoelectron spectroscopy, we find a complete degradation of the precursors in contact with ZnO and the formation of volatile species as well as new surface bonds. Our computational work reveals that different pristine and defected surface terminations of ZnO facilitate the decomposition of the perovskite precursor molecules, mainly through deprotonation, making the deposition of the latter on those surfaces impossible without the use of passivation.
引用
收藏
页码:14984 / 14994
页数:11
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