Large-area SiC Schottky barrier diodes can significantly improve the sensitivity in radiation detection due to the increased interacting SiC volume. In this work, we tested a large SiC detector with an area of 1 x 1 cm2. Extensive electrical characterization was performed at temperatures ranging from 150 K to 390 K, demonstrating the impact of barrier inhomogeneities on the electrical performance of the diode. Forward current-voltage (I-V) measurements of the diodes revealed two distinct regions caused by Schottky barrier inhomogeneity present throughout the entire temperature range. The barrier heights in the low- and high-current forward voltage regions were extracted from Richardson plots corrected for the Gaussian distribution of barrier heights, yielding values of 1.52 eV and 1.79 eV, respectively. Deep-level transient spectroscopy (DLTS) revealed only one deeplevel defect, Z1/2, with an activation energy for electron emission of 0.67 eV, which was assigned to the known carbon vacancy. The DLTS study showed no correlation between electrically active defects and barrier inhomogeneity. An excellent energy resolution of 3.2 % was measured using a large area 241Am radiation source, consistent with values for small area SiC detectors that exhibited no barrier height inhomogeneities. The impact of temperature on the alpha particle radiation response was determined within a temperature range of 200 K to 390 K.
机构:
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Univ Chinese Acad Sci, Sch Microelect, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Wu, Zhikang
Bai, Yun
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Bai, Yun
Yang, Chengyue
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Yang, Chengyue
Lu, Jiang
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Lu, Jiang
Yang, Liao
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Univ Chinese Acad Sci, Sch Microelect, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Yang, Liao
Tang, Yidan
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Tang, Yidan
Tian, Xiaoli
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Tian, Xiaoli
Liu, Xinyu
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
机构:
Hitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
Okino, Hiroyuki
Kameshiro, Norifumi
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Hitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
Kameshiro, Norifumi
Konishi, Kumiko
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Hitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
Konishi, Kumiko
Shima, Akio
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Hitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan
Shima, Akio
Yamada, Ren-ichi
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Hitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, JapanHitachi Ltd, Cent Res Lab, 1-280 Higashi Koigakubo, Kokubunji, Tokyo 1858601, Japan