Perfect control of spin, valley and spin-valley-coupled currents in bilayer graphene on WSe2 magnetic junction: Effect of spin-valley dependent Fermi level and energy gap
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作者:
Jatiyanon, Kitakorn
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Rangsit Univ, Fac Sci, Dept Phys, Pathum Thani 12000, ThailandRangsit Univ, Fac Sci, Dept Phys, Pathum Thani 12000, Thailand
Jatiyanon, Kitakorn
[1
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Soodchomshom, Bumned
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Kasetsart Univ, Fac Sci, Dept Phys, Bangkok 10900, ThailandRangsit Univ, Fac Sci, Dept Phys, Pathum Thani 12000, Thailand
We investigate the spin-valley dependent transport properties in a gated bilayer graphene (BG) junction placed on top of WSe2. By means of layer-dependent proximity, the spin-orbit interaction (SOI) is induced in the bottom layer, while the top layer is induced into ferromagnetism by a magnetic insulator. As a result of these differing properties, the Fermi level and energy gap become spin-valley dependent, which could lead to controllable spin -and valley-dependent filtering in the BG system. Our findings predict perfect spin-valley polarization control through gate control, given specific energy and electric field conditions, as well as spin-valley-coupled and spin currents when both the electric-field-induced energy gap and the exchange energy are equal to the SOI strength. We predict that there will be very highly sensitive gate control of-100% to + 100% of spin-valley-coupled polarization for large barrier thickness. Additionally, we predict 100% valley polarization can be controlled by the gate when the exchange energy is equal to the SOI. Furthermore, we found that the performance of the junction to control the polarizations can be enhanced by increasing the thickness of the junction. This work reveals the potential of the BG/WSe2 hybrid structure for spin-valley-current-based electronics, such as spin-, valley-, and spin-valley field-effect transistors.
机构:
MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Cao, Yuan
;
Fatemi, Valla
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MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Fatemi, Valla
;
Fang, Shiang
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Harvard Univ, Dept Phys, Cambridge, MA 02138 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Fang, Shiang
;
Watanabe, Kenji
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Natl Inst Mat Sci, Namiki 1-1, Tsukuba, Ibaraki 3050044, JapanMIT, Dept Phys, Cambridge, MA 02139 USA
Watanabe, Kenji
;
Taniguchi, Takashi
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Natl Inst Mat Sci, Namiki 1-1, Tsukuba, Ibaraki 3050044, JapanMIT, Dept Phys, Cambridge, MA 02139 USA
Taniguchi, Takashi
;
Kaxiras, Efthimios
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机构:
Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
Harvard Univ, John A Paulson Sch Engn & Appl Sci, Cambridge, MA 02138 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Kaxiras, Efthimios
;
Jarillo-Herrero, Pablo
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机构:
MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA
机构:
MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Cao, Yuan
;
Fatemi, Valla
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机构:
MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Fatemi, Valla
;
Fang, Shiang
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机构:
Harvard Univ, Dept Phys, Cambridge, MA 02138 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Fang, Shiang
;
Watanabe, Kenji
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h-index: 0
机构:
Natl Inst Mat Sci, Namiki 1-1, Tsukuba, Ibaraki 3050044, JapanMIT, Dept Phys, Cambridge, MA 02139 USA
Watanabe, Kenji
;
Taniguchi, Takashi
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Namiki 1-1, Tsukuba, Ibaraki 3050044, JapanMIT, Dept Phys, Cambridge, MA 02139 USA
Taniguchi, Takashi
;
Kaxiras, Efthimios
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机构:
Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
Harvard Univ, John A Paulson Sch Engn & Appl Sci, Cambridge, MA 02138 USAMIT, Dept Phys, Cambridge, MA 02139 USA
Kaxiras, Efthimios
;
Jarillo-Herrero, Pablo
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MIT, Dept Phys, Cambridge, MA 02139 USAMIT, Dept Phys, Cambridge, MA 02139 USA