Energy levels of carbon dangling-bond center (PbC center) at 4H-SiC(0001)/SiO2 interface

被引:3
|
作者
Sometani, Mitsuru [1 ]
Nishiya, Yusuke [2 ]
Kondo, Ren [3 ]
Inohana, Rei [3 ]
Zeng, Hongyu [3 ]
Hirai, Hirohisa [1 ]
Okamoto, Dai [3 ]
Matsushita, Yu-ichiro [2 ,4 ]
Umeda, Takahide [3 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Adv Power Elect Res Ctr, 16-1 Onogawa, Tsukuba, Ibaraki 3058569, Japan
[2] Tokyo Inst Technol, Inst Innovat Res, 2-12-1 Ookayama,Meguro Ku, Tokyo 1528550, Japan
[3] Univ Tsukuba, Grad Sch Pure & Appl Sci, 1-1-1 Tennodai, Tsukuba, Ibaraki 3058577, Japan
[4] Natl Inst Quantum Sci & Technol, Quantum Mat & Applicat Res Ctr, 2-12-1, Ookayama,Meguro Ku, Tokyo 1528552, Japan
关键词
CHANNEL MOBILITY; 4H-SIC MOSFETS; SIC TECHNOLOGY; DENSITY; CRYSTAL; IMPACT; TRAPS;
D O I
10.1063/5.0171143
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electric properties of the carbon dangling-bond (P-bC) center at a thermally oxidized 4H-SiC(0001)/SiO2 interface are investigated. We experimentally and theoretically determine the energy levels of the associated interface states to estimate the impacts of the P-bC center on power device operations. By combining electrically detected magnetic resonance spectroscopy and capacitance-voltage measurements, the two P-bC electronic levels [(0/-) and (+/0)] are determined as similar to 1.2 and 0.6 eV from the valence band maximum, respectively. The effective correlation energy of the P-bC center is 0.6 eV, which is 1.5 times larger than that of the silicon dangling-bond (P-b) center at Si/SiO2 interfaces. Our first-principles calculations confirm that the electronic levels of P-bC are similar to experimental values. Considering these energy levels, the P-bC center must impact both p- and n-channel devices, which is closely related to previously reported channel features. (c) 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license
引用
收藏
页数:5
相关论文
共 50 条
  • [11] Nitrogen-Induced Changes in the Electronic and Structural Properties of 4H-SiC (0001)/SiO2 Interfaces
    Wang, Lu
    Dhar, Sarit
    Feldman, Leonard C.
    Kuroda, Marcelo A.
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2022, 259 (02):
  • [12] Fabrication of SiO2/4H-SiC (0001) interface with nearly ideal capacitance-voltage characteristics by thermal oxidation
    Kikuchi, Richard Heihachiro
    Kita, Koji
    APPLIED PHYSICS LETTERS, 2014, 105 (03)
  • [13] Understanding the inversion-layer properties of the 4H-SiC/SiO2 interface
    Matocha, Kevin
    Tilak, Vinayak
    SILICON CARBIDE AND RELATED MATERIALS 2010, 2011, 679-680 : 318 - 325
  • [14] The influence of excess nitrogen, on the electrical properties of the 4H-SiC/SiO2 interface
    Pintilie, I.
    Moscatelli, F.
    Nipoti, R.
    Poggi, A.
    Solmi, S.
    Lovlie, L. S.
    Svensson, B. G.
    SILICON CARBIDE AND RELATED MATERIALS 2010, 2011, 679-680 : 326 - +
  • [15] Electrical and physical characterizations of the effects of oxynitridation and wet oxidation at the interface of SiO2/4H-SiC(0001) and (000(1)over-bar)
    Shiomi, Hiromu
    Kitai, Hidenori
    Tsujimura, Masatoshi
    Kiuchi, Yuji
    Nakata, Daisuke
    Ono, Shuichi
    Kojima, Kazutoshi
    Fukuda, Kenji
    Sakamoto, Kunihiro
    Yamasaki, Kimiyohi
    Okumura, Hajime
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (04)
  • [16] Unexpected fixed charge generation by an additional annealing after interface nitridation processes at the SiO2/4H-SiC (0001) interfaces
    Kil, Tae-Hyeon
    Yang, Tianlin
    Kita, Koji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SH)
  • [17] Effect of boron incorporation on slow interface traps in SiO2/4H-SiC structures
    Okamoto, Dai
    Sometani, Mitsuru
    Harada, Shinsuke
    Kosugi, Ryoji
    Yonezawa, Yoshiyuki
    Yano, Hiroshi
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (02):
  • [18] Detection and Cryogenic Characterization of Defects at the SiO2/4H-SiC Interface in Trench MOSFET
    Berens, Judith
    Rasinger, Fabian
    Aichinger, Thomas
    Heuken, Michael
    Krieger, Michael
    Pobegen, Gregor
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (03) : 1213 - 1217
  • [19] Hetero-interface properties of SiO2/4H-SiC on various crystal orientations
    Matsunami, H
    Kimoto, T
    Yano, H
    IEICE TRANSACTIONS ON ELECTRONICS, 2003, E86C (10) : 1943 - 1948
  • [20] Effects of sodium ions on trapping and transport of electrons at the SiO2/4H-SiC interface
    Basile, A. F.
    Ahyi, A. C.
    Feldman, L. C.
    Williams, J. R.
    Mooney, P. M.
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (03)