Effect of deposition temperature on the tribo-mechanical properties of nitrogen doped DLC thin film

被引:1
|
作者
Shanmugasundar, G. [1 ]
Vanitha, M. [2 ]
Logesh, K. [3 ]
Cepova, Lenka [4 ]
Elangovan, Muniyandy [5 ,6 ]
机构
[1] Sri Sai Ram Inst Technol, Dept Mech Engn, Chennai, India
[2] Sri Sairam Engn Coll, Dept Chem, Chennai, India
[3] Vel Tech Rangarajan Dr Sagunthala R&D Inst Sci & T, Dept Mech Engn, Avadi, India
[4] VSB Tech Univ Ostrava, Fac Mech Engn, Dept Machining Assembly & Engn Metrol, Ostrava, Czech Republic
[5] Bond Marine Consultancy, Dept R&D, London, England
[6] Saveetha Inst Med & Tech Sci, Saveetha Sch Engn, Dept Biosci, Chennai, India
来源
FRONTIERS IN MECHANICAL ENGINEERING-SWITZERLAND | 2024年 / 10卷
关键词
nitrogen-doped diamond-like carbon; tribomechanical properties; chemical vapor deposition; nanoindentation; deposition temperature; LOW-FRICTION; CARBON; SILICON; WEAR; LOAD; N-2;
D O I
10.3389/fmech.2024.1365555
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
The tribomechanical characteristics of diamond-like carbon (DLC) coatings are notably superior to other hard coatings, making them highly desirable for industrial applications. This study focuses on the synthesis of nitrogen-doped DLC (N-DLC) films through chemical vapor deposition (CVD) methods, with an emphasis on varying the deposition temperature. Comprehensive characterization techniques such as atomic force microscopy (AFM), scanning electron microscopy (SEM), and nanoindentation were employed to investigate the morphological and mechanical attributes of these coatings. The thickness of the films, measured using a Dektak profilometer, demonstrated an increase from 1.9 to 2.8 mu m as the deposition temperature rose. Nanoindentation testing revealed that the film deposited at 900 degrees C exhibited the highest hardness (H) and modulus of elasticity (E), measuring 21.95 and 208.3 GPa, respectively. Conversely, the film deposited at 1,000 degrees C showed the lowest values, with H and E at 14.23a and 141.9 GPa, respectively. The H/E ratio of the coatings initially rose from 0.096 to 0.106 as the deposition temperature increased from 800 degrees C to 900 degrees C. However, for deposition temperatures exceeding 900 degrees C the H/E ratio began to decline.
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页数:8
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