Formation of porous Ga oxide with high-aspect-ratio nanoholes by anodizing single Ga crystal

I developed a simple crystal growth process to obtain a single Ga crystal. The crystal orientation of a Ga plate could be controlled by a crystal growth process using a seed Ga crystal. By anodizing a [100]-direction highly oriented Ga plate, I realized the formation of a highly ordered array of high-aspect-ratio straight nanoholes. It was observed that the nanohole growth direction depends on the crystal orientation of a Ga plate. To date, this dependence has yet to be observed in materials other than porous Ga oxide obtained by an anodization process. The present fabrication process is expected to be applied to the fabrication of various functional devices requiring a porous Ga oxide with high-aspect-ratio straight nanoholes, such as hydrogen formation devices and functional filters.