Behavior of 355 nm laser-induced damage growth in fused silica

被引:8
作者
Liu, Hufeng [1 ]
Wang, Biyi [2 ]
Miao, Xinxiang [3 ]
Xu, Man [1 ]
Liu, Xinyi [1 ]
Zhang, Fawang [1 ]
Lu, Tao [4 ]
Qiu, Rong [1 ]
Guo, Decheng [1 ]
Zhou, Qiang [1 ]
Jiang, Yong [1 ]
机构
[1] Southwest Univ Sci & Technol, Sch Math & Phys, Mianyang 621010, Sichuan, Peoples R China
[2] Sci & Technol Electroopt Informat Secur Control L, Tianjin 300308, Peoples R China
[3] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China
[4] China Univ Geosci, Sch Automat, Wuhan 430074, Peoples R China
基金
中国国家自然科学基金;
关键词
Fused silica; Damage growth; Shock wave; Plasma; Cracks; EXIT-SURFACE; OPTICS; MORPHOLOGY; UV; ABSORPTION; FRACTURE; MODEL; WAVE;
D O I
10.1016/j.optlastec.2022.108847
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The behavior of morphology and crack propagation during damage growth on the rear surface of fused silica is studied using a time-resolved shadow imaging technique. The mechanism and distribution characteristics of the plasma caused by energy deposition during the damage growth process and the effect on crack extension are studied. Finally, the properties of shock and stress waves and their effects on the damage growth are discussed. The results indicate that the damage growth process leads to significant differences in the transmission of shock and stress waves. The growth size of the damage site leads to a significant energy concentration deposition effect, which induces a local enhancement of the plasma that subsequently affects the crack distribution. It contributes to the transition from radial to circumferential crack and also further accelerates the damage growth process. The results could contribute to experimental support for further understanding of the physical mechanism of fused silica damage and the fundamental principles of damage growth.
引用
收藏
页数:10
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