The growth mechanisms of TiO2 film onto PET surfaces by atomic layer deposition

Atomic layer deposition (ALD) was used to coat a polyethylene terephthalate (PET) polymer substrate with TiO2 film. The TiO2 was grown onto the surface with better film coverage by using thicker ALD deposition. Further evaluation on the coated substrates indicated that the reactive sites of -C=O that existed on PET surface played a significant contribution to facilitating the initial ALD growth of the TiO2 thin film. The chemical composition of the coated substrates was characterised using energy dispersive X-ray spectroscopy, which showed that increasing the TiO2 film thickness increased the Ti element content. Two growth mechanisms, namely, diffusion growth and direct coordination through the precursor coordination with surface reactive sites of -C=O with product release occurred simultaneously in the initial growth of TiO2 coating onto PET polymer by ALD. The surface alteration of the coated ALD was characterised by Fourier transform infrared spectroscopy, which showed that the hydroxyl -OH groups emerged in the TiO2 ALD film.