Effect of annealing on the properties of plasma-enhanced atomic layer deposition grown HfO2 coatings for ultraviolet laser applications

被引:12
作者
Lin, Zesheng [1 ,2 ]
Zhu, Meiping [1 ,2 ,3 ]
Song, Chen [1 ]
Liu, Tianbao [1 ,2 ]
Yin, Chaoyi [1 ]
Zeng, Tingting [1 ]
Shao, Jianda [1 ,2 ,3 ,4 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Thin Film Opt, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[3] Univ Chinese Acad Sci, Hangzhou Inst Adv Study, Hangzhou 310024, Peoples R China
[4] CAS Ctr Excellence Ultraintense Laser Sci, Shanghai 201800, Peoples R China
基金
中国国家自然科学基金;
关键词
Plasma-enhanced atomic layer deposition; HfO 2 monolayer coating; Oxygen atmosphere annealing; Laser-induced damage threshold; THIN-FILMS; ELECTRICAL-PROPERTIES; MICROSTRUCTURE;
D O I
10.1016/j.jallcom.2023.169443
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
HfO2 monolayer coatings are grown by plasma-enhanced atomic layer deposition (PEALD), and the effects of the thermal annealing atmosphere and temperature on the surface morphology, crystal structure, chemical composition, optical absorption, and laser-induced damage threshold (LIDT) of the HfO2 monolayer coatings are investigated. The experimental results show that annealing in an oxygen atmosphere is more beneficial to the decomposition of impurity compounds (carbonates and amines) and the elimination of oxygen deficiency in HfO2 coating than in a nitrogen atmosphere. Compared to the as-deposited coating, the HfO2 coating annealed under an oxygen atmosphere and specific temperature has lower C and N impurity contents, a better stoichiometric ratio, and thus lower absorption and higher LIDT. The highest LIDT (at 355 nm) of 6.3 J/cm2 is obtained at an annealing temperature of 700 celcius, which is approximately three times that of the as-deposited coating. We believe that this experimental result can help improve the LIDT of PEALD-grown oxide coatings or other oxide coatings containing similar impurities.(c) 2023 Elsevier B.V. All rights reserved.
引用
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页数:10
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