Dynamics of sputtered particles in multipulse HiPIMS discharge

被引：4
作者：
Hnilica, J. [1 ]
Klein, P. [1 ]
Vasina, P. [1 ]
Snyders, R. [2 ,3 ]
Britun, N. [2 ,4 ]
机构：
[1] Masaryk Univ, Dept Phys Elect, Kotlarska 2, CZ-61137 Brno, Czech Republic
[2] Univ Mons, Chim Interact Plasma Surface ChIPS, CIRMAP, 23 Pl Parc, B-7000 Mons, Belgium
[3] Mat Nova Res Ctr, Parc Initialis, B-7000 Mons, Belgium
[4] Nagoya Univ, Ctr Low Temp Plasma Sci, Chikusa Ku, Nagoya 4648603, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2023年 / 32卷 / 04期
关键词：
sputtering; multipulse; HiPIMS; discharge; LIF; AAS; THIN-FILMS; DEPOSITION RATE; PULSED DC; POWER; COATINGS; PLASMA; ENHANCEMENT; TRANSPORT;
D O I：
10.1088/1361-6595/acc686
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced fluorescence was used for imaging the discharge volume (density mapping) during the plasma-on and plasma-off time phases. The role of the number of micropulses and delay time between the micropulses in the pulse package is analyzed and discussed systematically. In addition, the propagation of the sputtered particles from the target is investigated.
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页数：12
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