Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces

被引:3
作者
Cheng, Erik S. S. [1 ]
Ventzek, Peter L. G. [2 ]
Hwang, Gyeong S. S. [1 ,3 ]
机构
[1] Univ Texas, Texas Mat Inst, Austin, TX 78712 USA
[2] Tokyo Electron Amer Inc, 2400 Grove Blvd, Austin, TX 78741 USA
[3] Univ Texas Austin, McKetta Dept Chem Engn, Austin, TX 78712 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2023年 / 41卷 / 04期
关键词
DYNAMICS; GE;
D O I
10.1116/6.0002656
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ion bombardment of amorphous silicon nitride (a-SiN) was simulated with self-consistent-charge density functional tight binding. These simulations were used to study bombardment-induced local heating events (often called "thermal spikes"). A model for estimating the thermal conductivity ( k) of a locally heated area was implemented, yielding a predicted k of 3 W/m K for a small region of the a-SiN substrate around an ion impact site. Based on the estimated k, a bombardment-induced thermal spike is predicted to return to the baseline substrate temperature after only 0.2 ps. Consequently, no cumulative heating would occur in substrates with similar k values, given a typical ion flux of less than 1 x 10(18) s(-1) cm(-2). Our simulations also show that surface reactions toward molecular adsorbates are not significantly facilitated by the thermal spike, largely due to its short duration.
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页数:8
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