Environmental Doping-Induced Degradation of the Quantum Anomalous Hall Insulators

被引:3
|
作者
Tay, Han [1 ]
Zhao, Yi-Fan [1 ]
Zhou, Ling-Jie [1 ]
Zhang, Ruoxi [1 ]
Yan, Zi-Jie [1 ]
Zhuo, Deyi [1 ]
Chan, Moses H. W. [1 ]
Chang, Cui-Zu [1 ,2 ]
机构
[1] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
[2] Penn State Univ, Mat Res Inst, University Pk, PA 16802 USA
关键词
quantum anomalous Hall insulator; topological insulator; molecular beam epitaxy growth; environmental doping; sample degradation; SINGLE DIRAC CONE; TOPOLOGICAL-INSULATOR; SURFACE-STATES; THIN-FILMS; REALIZATION; CONDUCTION; CATALOG; BI2TE3;
D O I
10.1021/acs.nanolett.2c04871
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The quantum anomalous Hall (QAH) insulator carries dissipation-free chiral edge current and thus provides a unique opportunity to develop energy-efficient transformative information technology. Despite promising advances, the QAH insulator has thus far eluded any practical applications. In addition to its low working temperature, the QAH state in magnetically doped topological insulators usually deteriorates with time in ambient conditions. In this work, we store three QAH devices with similar initial properties in different environments. The QAH device without a protection layer in air shows clear degradation and becomes hole-doped. The QAH device kept in an argon glovebox without a protection layer shows no measurable degradation after 560 h, and the device protected by a 3 nm AlOx protection layer in air shows minimal degradation with stable QAH properties. Our work shows a route to preserve the dissipation-free chiral edge state in QAH devices for potential applications in quantum information technology.
引用
收藏
页码:1093 / 1099
页数:7
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