All-solid-state far-UVC pulse laser at 222 nm wavelength for UVC disinfection

被引:5
|
作者
Luo, Qihui [1 ,2 ]
Ma, Jian [1 ]
Wang, Miao [1 ,2 ]
Lu, Tingting [1 ]
Zhu, Xiaolei [1 ,2 ,3 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Space Laser Commun & Detect Technol, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[3] Pilot Natl Lab Marine Sci & Technol, Qingdao 266237, Peoples R China
基金
上海市自然科学基金; 中国国家自然科学基金;
关键词
all-solid-state pulse laser; UVC disinfection; optical parametric oscillator; second-harmonic generation;
D O I
10.3788/COL202321.011401
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A 222 nm all-solid-state far-ultraviolet C (UVC) pulse laser system based on an optical parametric oscillator (OPO) and second-harmonic generation (SHG) using beta-Ba2BO4 (BBO) crystals was demonstrated. Pumped by a Nd:Y3Al5O12 laser with a repetition rate of 100 Hz at 355 nm, the maximum signal laser pulse energy of 1.22 mJ at 444 nm wavelength was obtained from the BBO-OPO system, corresponding to a conversion efficiency of 27.9%. The maximum output pulse energy of 164.9 mu J at the 222 nm wavelength was successfully achieved, corresponding to an SHG conversion efficiency of 16.2%. Moreover, the tunable output wavelength of UVC light from 210 nm to 252.5 nm was achieved.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] All-solid-state far-UVC pulse laser at 222 nm wavelength for UVC disinfection
    罗琪卉
    马剑
    王淼
    陆婷婷
    朱小磊
    Chinese Optics Letters, 2023, 21 (01) : 80 - 84
  • [2] Inactivation Effect of All-Solid-State 228 nm Far-UVC Pulsed Laser
    Zhibin, Zhao
    Cheng, Cheng
    Yinghong, Jin
    Wenbo, Zeng
    Qinlong, Jin
    Quan, Li
    Jiaojiao, Li
    Yi, Qu
    Baoxue, Bo
    Zhongguo Jiguang/Chinese Journal of Lasers, 2022, 49 (15):
  • [3] Inactivation Effect of All-Solid-State 228 nm Far-UVC Pulsed Laser
    Zhao Zhibin
    Cheng Cheng
    Jin Yinghong
    Zeng Wenbo
    Jin Qinlong
    Li Quan
    Li Jiaojiao
    Qu Yi
    Bo Baoxue
    CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2022, 49 (15):
  • [4] Safety and efficacy of 222-nm far-UVC disinfection for ophthalmic surgery
    Chen, Tu-Wen
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 2023, 64 (08)
  • [5] Ocular and Facial Far-UVC Doses from Ceiling-Mounted 222 nm Far-UVC Fixtures
    Duncan, Michael A.
    Welch, David
    Shuryak, Igor
    Brenner, David J.
    PHOTOCHEMISTRY AND PHOTOBIOLOGY, 2023, 99 (01) : 160 - 167
  • [6] Far-UVC 222 nm Treatment: Effects of Nitrate/Nitrite on Disinfection Byproduct Formation Potential
    Xu, Jiale
    Kann, Ryan J.
    Mohammed, Dauda
    Huang, Ching-Hua
    ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2024, 58 (34) : 15311 - 15320
  • [7] Investigation of Far-UVC (222 nm) disinfection of bioaerosols deposited on surfaces with different material properties
    Guo, Kangqi
    Chen, Chun
    JOURNAL OF HAZARDOUS MATERIALS, 2024, 465
  • [8] Photochemical Action of Far-UVC Radiation (222 nm) in Wastewater Treatment and Indoor Air Disinfection
    Das, Aurosikha
    Monika, Ambarish
    Kunwar, Ambarish
    CHEMISTRY-AN ASIAN JOURNAL, 2024, 19 (23)
  • [9] Different biological effects of exposure to far-UVC (222 nm) and near-UVC (254 nm) irradiation
    Napolea, Renata Spagolla
    Adamoski, Douglas
    Girasole, Alessandra
    Lima, Ellen Nogueira
    Justo-Junior, Amauri da Silva
    Domingues, Romenia
    Silveira, Ana Clara Caznok
    Marques, Rafael Elias
    de Carvalho, Murilo
    Ambrosio, Andre Luis Berteli
    Leme, Adriana Franco Paes
    Dias, Sandra Martha Gomes
    JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY B-BIOLOGY, 2023, 243
  • [10] Synergistic disinfection of aerosolized bacteria and bacteriophage by far-UVC (222-nm) and negative air ions
    Lu, Y. H.
    Wu, H.
    Zhang, H. H.
    Li, W. S.
    Lai, A. C. K.
    JOURNAL OF HAZARDOUS MATERIALS, 2023, 441